an example

Sunburst Turbo
™
Megasonic Cleaning and Rinsing Systems
Features Overview
• Verteq’s patented and proven high-performance
Sunburst® Turbo™ megasonic transducer
• Cassette configurations include continuous 52-wafer
capacity compatible with “reduced” and “low-mass”
cassettes, dual end-to-end cassettes, dual side-by-side
cassettes, and single cassette
• Quartz, PVDF, Natural Polypropylene tank materials
• 300mm, 200mm, and 150mm models available
Process Performance
• Consistently near-100% particle removal efficiencies at
0.15µm and smaller particle sizes
• Strategically located curved transducer directs energy
between cassette sidewalls to eliminate shadowing
Sunburst Turbo megasonic quartz tank models feature rounded corners, foursided overflow, Chemraz® transducer seals, and advanced design for the quartz
to PFA tubing transition. 200mm model shown.
• Energy pattern cleans cassette slots while eliminating
the cassette damage caused by flat transducers
• Sunburst Turbo Quickdump™ megasonic rinsers reduce
water consumption and shorten cycle times
• Sunburst Turbo Quickdump™ megasonic rinsers reduce
defect density by reducing particle reattachment
• Quartz tanks feature rounded “seamless” corners for
state-of-the-art cleanliness
• Optional Chemraz® elastomers for maximum chemical
resistance and service life
• Single-, Dual-, and Four-sided overflow with scalloped
or serrated weirs and deep trough for recirculation
Reliability and Integration
• With hundreds of long-term installations in the world’s
leading production fabs, no other megasonic has proven
to have greater longevity, reliability, or performance
• Several controller configurations available to meet OEM
and end-user needs
• PLC and SECS-II communication compatibility
• Integral nitrogen “bubbler” level sensor, and transducer
cooling flow sensor
The official factory source for all
Verteq products and services.
Sunburst Turbo megasonic cleaning tank (left), and Sunburst Turbo Quickdump
rinse tank (right) shown in PVDF for 200mm wafers. Also available in natural
polypropylene.
Sunburst Turbo/Turbo Quickdump
Applications
Performance
Sunburst Turbo
70%
60%
50%
40%
10%
0%
2 min
4
Verteq STQD
3
Quickdump
2
Meg Overflow
1
Overflow
930
870
810
750
690
630
570
-30
510
0
• Masks, Glass, and more
450
• Hard disks
5
390
• Silicon Carbide
6
330
• GaAs wafers
Post-Sulfuric Rinse pH
• Silicon wafers, thin wafers
10 min
7
• Other critical and final rinse requirements
Substrates
5 min
In this Sunburst Turbo™ megasonic test, 200mm wafers dipped in silicon
nitride and dried, were cleaned with a dilute SC-1 mixture of 80:4:1 at
60°C. Removal efficiency was calculated for particles ≥ 0.2µm.
270
• Post acid rinses for sulphuric, phosphoric, others
ST off
20%
• and more
Sunburst Turbo Quickdump
ST on
30%
210
• Post-Laserscribe Clean
80%
150
• Monitor Wafer Clean
99.2 %
98.5 %
96.8 %
90
• Pre-Epi Clean
90%
30
• Pre-Diffusion Clean
Removal Efficiency %
Traditional and dilute SC-1, SC-2, and similar
chemistries for:
100%
Time (seconds)
A Sunburst Turbo Quickdump™ megasonic rinse process rapidly removes
residual chemistry to significantly decrease process time and water consumption in post-sulfuric and other post-acid rinse applications.
1.00
Controllers for the ST and STQD megasonic models come in
a variety of packages to optimize integration and routing of
cables.
Normalized Defect Density
1.0
B
0.9
0.8
0.7
H
Verteq STQD
B
Standard Rinse
0.68
B
0.6
0.5
0.39
0.4
B
0.3
0.2
0.1
0.0
0.22
0.13
B
B
0.012
0.012
0.015
0.013
0.013
5 hrs
10 hrs
15 hrs
20 hrs
25 hrs
H
H
H
H
H
Verteq’s Sunburst Turbo Quickdump™ megasonic rinse process increases
the useable life of sulfuric and other acid baths, and decreases the defect
density of the entire process significantly.
Marteq Process Solutions, Inc.
17500 Gillette Avenue • Irvine, California, USA 92614-5610
Phone: (714) 495-4275 • Email: sales@marteqpro.com
The official factory source for all
Verteq products and services.
© Marteq Process Solutions, Inc. (02/2009 • LIT2207)