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Call for Abstracts
AVS American Vacuum Society 125 Maiden Lane, 15th Floor New York, NY 10038 Tel: 212-248-0200 AVS 62 Call For Abstracts T he AVS 62nd International Division/Group Programs Symposium and Exhibition fosters n Advanced Surface Engineering an interdisciplinary environment n Applied Surface Science featuring a plenary, parallel topical n Biomaterial Interfaces & Biomaterials sessions from AVS technical divisions, Plenary technology groups, and focus topics, poster sessions, and an equipment exhibition. n Electronic Materials & Processing Check out the AVS Technical Library for n Magnetic Interfaces & Nanostructures Past Symposia Virtual Programs and n Manufacturing Science & Technology Presentations on Demand. n MEMS and NEMS An extensive array of tools, equipment, service, and publications will be displayed n Nanometer-scale Science & Technology at the Exhibit from Tuesday morning until n Plasma Science & Technology Thursday afternoon. n Surface Science Short courses and Tutorials that pron Thin Films vide specialized training in specific areas n Vacuum Technology of vacuum science and related technologies will be offered. Focus TopicS & Other Sessions Division/Group/Focus Topic Awards and n 2D Materials Travel Grants are being solicited. n Accelerating Materials Discovery for Global Competitiveness n Actinides & Rare Earths n Additive Manufacturing/3D Printing Invited Speakers 300+ Invited Speakers, including: Judy Cha, Yale University Plenary Speaker: Robert S. Chau, Intel Senior Fellow and Director of Transistor Research and Nanotechnology in the Technology and Manufacturing Group at Intel Corporation, Li-Chyong Chen, National Taiwan University “Electronic Materials Research and Development for Future Computation and System On Chip Applications” Eshraq Al Dmour, Max IV, Lund University, Sweden Donna Chen, University of South Carolina Rowena Crockett, ETH Shane Cybart, University of California, San Diego Melissa Denecke, University of Manchester, United Kingdom of Great Britain and Northern Ireland Phill Dickens, University of Nottingham, UK Jennifer Fielding, AFRL (NAMII) n Abstract Deadline: May 4, 2015 Complete Details at www.avs.org Jacob Israelachvili, University of Buddy D. Ratner, University of California, Santa Barbara Washington Kimberly Turner, University of California, Santa Barbara Thomas Jaramillo, Stanford University Arend van der Zande, Columbia University Noo Li Jeon, Seoul National University, Korea Matt Kowitt, Stanford Research Systems Young Kuk, Seoul National University, Korea Ralf Richter, CIC biomaGUNE Debra Rolison, Naval Research Laboratory Michael Roukes, California Institute of Technology Jean-Luc Rouviere, CEA-Leti, France Zhiyong Ma, Intel Simone Ruggeri, EPFL, Switzerland Hari Manoharan, Stanford University Miquel Salmeron, Lawrence Berkeley National Lab Yongfeng Mei, Fudan University Robert Schlogol, FHI, Max Planck Society, Germany Philip Messersmith, University Anna Fontcuberta i Morral, of California, Berkeley Ecole Polytechnique Fédérale de Masaaki Nagatsu, Shizuoka Anna Balazs, University of Lausanne University, Japan Pittsburgh Hajo Freund, Fritz Haber Olga Ovchinnikova, Oak Ridge James Batteas, Texas A&M Institute, Germany National Laboratory Geoff Beach, MIT Krzysztof Gofryk, Idaho Nam-Gyu Park, Sungkyunkwan Stacey Bent, Stanford University National Laboratory University, Korea Stefan Bonetti, University of Roy Gordon, Harvard University Kristin Persson, Lawrence Stockholm, Sweden David Graves, University of Berkeley National Laboratory Bill Bottoms, Third Millenium California, Berkeley David Pui, University of Test Solutions Birgit Hagenhoff (ToF-SIMS), Minnesota Mark Bradley, University of TASCON, GmbH, Germany Ramamurthy Ramprasad, Edinburgh, UK Suvi Haukka, ASM University of Connecticut Ken Burch, Boston College Microchemistry, Finland Alok Ranjan, TEL Technology Cristina Canal, Universitat Tony Heinz, Columbia University Center of America Politècnica de Catalunya, Spain Dieter Isheim, Northwestern University Ana Claudia Arias, UC Berkeley Atom Probe Tomography Energy Frontiers n Exhibitor Technology Spotlight n Helium Ion Microscopy n In-Situ Spectroscopy & Microscopy n IPF on Mesoscale Science and Technology of Materials and Metamaterials n Materials Characterization in the Semiconductor Industry n Novel Trends in Synchrotron & FEL-Based Analysis n Scanning Probe Microscopy n Selective Deposition as an Enabler of Self-Alignment n Spectroscopic Ellipsometry n Surface Modification of Materials by Plasmas for Medical Purposes n Tribology n Daniel Schreiber, Pacific Northwest National Laboratory Dario Stacchiola, Chemistry Department, Brookhaven National Laboratory Hans-Peter Steinrueck, University of ErlangenNuremberg, Germany Adrienne Stiff-Roberts, Duke University Yayoi Takamura, University of California at Davis Shida Tan, Intel Corporation Mauritius C.M. van De Sanden, DIFFER, The Netherlands Tonya Vitova, Karlsruhe Institute of Technology, Germany Virginia Wheeler, Naval Research Laboratory Bernd Winter, HelmholtzZentrum Berlin für Materialien und Energie/ Elektronenspeicherring BESSY II, Berlin, Germany Charles Winter, Wayne State University Tom Wirtz, Centre de Recherche Public – Gabriel Lippmann, Luxembourg Grace Xing, Cornell University Eli Yablonovitch, University California Berkeley Oleg Yazyev, Ecole Polytechnique Fédérale de Lausanne, Switzerland Bilge Yildiz, MIT Pengpeng Zhang, Michigan State University Jeffery Terry, Illinois Institute of Eva Zurek, University at Technology Buffalo-SUNY Mathias Thuvander, Chalmers, Sweden The AVS 62nd International Symposium & Exhibition On behalf of the AVS community, we invite you to submit an abstract to the AVS 62 nd International Symposium and Exhibition that will take place the week of October 18-23, 2015 in San Jose, California. We are fortunate to have Dr. Robert Chau, Director of Transistor Research and Nanotechnology in the Technology and Manufacturing Group at Intel Corporation, kick off the Symposium with a Plenary Lecture on “Electronic Materials Research and Development for Future Computation and System-On-Chip Applications.” This topic is appropriate because we will be in the heart of Silicon Valley and because so much of the surface, materials, processing, and interface research that will be presented at the meeting is motivated by applications. We are also fortunate this year to have the AIP Industrial Physics Forum on “Mesoscale Science and Technology of Materials and Metamaterials.” Several of the divisions and focus topics will run sessions to complement the all-invited IPF sessions. The other focus topics that will be featured at this meeting are 2D Materials, Additive Manufacturing, Materials Characterization in the Semiconductor Industry, Selective Deposition as an Enabler of Self-Alignment, In situ Spectroscopy and Microscopy, Helium Ion Microscopy, Scanning Probe Microscopy, Spectroscopic Ellipsometry, Actinides and Rare Earths, Atom Probe Tomography, Synchrotron Analysis, Energy Frontiers, Accelerating Materials Discovery for Global Competitiveness, Tribology, and Surface Modification by Plasmas for Medicine. These topics will complement our traditional strong core on fundamental surface science and interfacial phenomena, applied surface science, surface engineering, micro- and nano-electronics, nanometer science and technology, manufacturing science and technology, thin films, plasma science and technology, micro- and nano-electromechanical systems, electronic and magnetic materials, biomaterials, and vacuum science and technology. This year is the 30th anniversary of the Applied Surface Science Division and several invited talks are planned to mark that milestone. Apropos of our location, several sessions are planned to gain different perspectives on the question “More Moore or More than Moore?” which will guide much of the development in the integrated circuit industry in the near future. We anticipate running 15 parallel sessions each day and devoting two evenings to poster sessions where we can debate some of the themes that will be presented during the meeting. We are planning a large equipment and product exhibit where the latest vacuum technology will be on display that makes cutting edge science possible. We have the good fortune to end the week with the IUVSTA meeting where prominent speakers from all over the world will review the latest breakthroughs in our core science and technology areas. As you browse the Call for Abstracts, we are certain that you will find many sessions that will be of interest, serve as the best venue for presenting your research in 2015, and provide ideas to start in new directions. We encourage you to participate in this year’s symposium by submitting an abstract before the deadline on Monday, May 4th. We look forward to receiving your abstract and welcoming you to AVS 62 in San Jose! Anthony J. Muscat 2015 Program Chair Lisa Porter 2015 Program Vice-Chair 1 P R O G R A M Program Chair Anthony Muscat University of Arizona anthony_muscat@avs.org Program Vice-Chair Lisa M. Porter Carnegie Mellon University lisa_porter@avs.org 2D Materials Focus Topic Co-Chair: Bolotin, Kirill, Vanderbilt Univ. Co-Chair: Gunlycke, Daniel, Naval Research Laboratory Co-Chair: Oleynik, Ivan, University of South Florida Borunda, Mario, Oklahoma State Univ. Castellanos Gomez, Andres, Delft University of Technology Chhowalla, Manish, Rutgers University Feng, Philip, Case Western Reserve Univ. Lau, ChunNing(Jeanie), University of California, Riverside Lay, Marcus, The Cooper Union for the Advancement of Science and Art Le Lay, Guy, Aix-Marseille Univ., France Ohta, Taisuke, Sandia National Labs Osgood, Richard, Columbia University Osterwalder, Juerg, Univ. of Zurich, Switzerland Park, Jiwoong, Cornell University Schuller, Jon, UC Santa Barbara Xu, Xiaodong, University of Washington C O M M I T T E E Durakiewicz, Tomasz, Los Alamos National Laboratory Geeson, David, AWE, UK Havela, Ladislav, Charles University, Czech Republic Petit, Leon, Daresbury Laboratory, UK Szakal, Christopher, National Institute of Standards and Technology (NIST) Szulczewski, Greg, The Univ. of Alabama Additive Manufacturing/3D Printing Co-Chair: Smentkowski, Vincent, General Electric Global Research Center Co-Chair: Svedberg, Erik B., The National Academies Dekker, Carl, Met-L-Flo Inc. Dong, Xia, Eli Lilly and Company Fitz-Gerald, James, University of Virginia Ghita, Oana, Univ. of Exeter, UK of Great Britain and Northern Ireland Orringer, Neal, 3D Systems Rogers, Bridget R., Vanderbilt University Whiting, Gregory, Palo Alto Research Ctr Biomaterial Interfaces Chair: Leggett, Graham, University of Sheffield, UK Allen, Stephanie, The University of Nottingham, UK Baio, Joe, Oregon State University Canavan, Heather, Univ. of New Mexico Chi, Eva, University of New Mexico Graham, Daniel, Univ. of Washington Hanley, Luke, Univ. of Illinois at Chicago Koelsch, Patrick, Univ. of Washington Latour, Robert, Clemson University Reviakine, Ilya, Karlsruhe Institute of Technology, Germany Rosenhahn, Axel, Ruhr-University Bochum, Germany Biomaterials Plenary Session Chair: Leggett, Graham, University of Sheffield, UK Electronic Materials and Processing Chair: King, Sean, Intel Corporation Antonelli, Andy, Lam Research Advanced Surface Engineering Conley, Jr., John F., School of Electrical Chair: Stueber, Michael, Karlsruhe Engineering and Computer Science, Institute of Technology, Germany Oregon State University, Corvallis OR Barankova, Hana, Uppsala Univ., Sweden Daniels-Race, Theda, Louisiana State Univ. Franz, Robert, Montanuniversität Leoben, Dietz, Nikolaus, Georgia State University Austria Durbin, Steve, Western Michigan University Klemberg-Sapieha, Jolanta, Ecole Filler, Michael, Georgia Institute of Tech. Polytechnique de Montreal, Canada Gupta, Jay, Oho State University Voevodin, Andrey, Air Force Research Lab Han, Sang M., University of New Mexico Hilton, Jessica, Mantis Deposition Applied Surface Science Accelerating Materials Discovery for Hinkle, Christopher, Univ. of Texas at Dallas Chair: Lloyd, Kathryn, DuPont Corporate Global Competitiveness Focus Topic Kim, Hyun Jung, NASA Langley Center for Analytical Sciences Chair: Rahman, Talat, University of Kummel, Andrew C., University of Dong, Xia, Eli Lilly and Company Central Florida California at San Diego Gaskell, Karen, University of Maryland, Co-Chair: Madsen, Lynnette, National Mohney, Suzanne, Pennsylvania State Univ. College Park Science Foundation (NSF) Myers-Ward, Rachael, U.S. Naval Research Lab. Ohlhausen, James A. (Tony), Sandia Alexander, Morgan, The University of Rockett, Angus, University of Illinois at National Laboratories Nottingham, UK Pacholski, Michaeleen, The Dow Chemical Urbana Champaign Colombo, Luigi, Texas Instruments Schultz, Brian, Raytheon Company de Leeuw, Nora, University College Tischler, Joseph G., U.S. Naval Research Lab. Stickle, William, Hewlett Packard London, UK Whiting, Gregory, Palo Alto Research Ctr. Szakal, Christopher, National Institute of Dowben, Peter, Univ. of Nebraska-Lincoln Zollner, Stefan, New Mexico State Univ. Standards and Technology (NIST) Fischer, Peter, Lawrence Berkeley National Tyler, Bonnie, National Physical Laboratory Energy Frontiers Focus Topic Laboratory (NPL), UK Jones, Sean, OSTP/NSF Chair: Baxter, Jason, Drexel University Ventrice, Jr., Carl, Univ. at Albany-SUNY Mueller, Tim, Johns Hopkins University Aydil, Eray, University of Minnesota Rogers, Bridget R., Vanderbilt University Bent, Stacey, Stanford University Atom Probe Tomography Focus Topic Soukhojak, Andrey, The Dow Chemical Filler, Michael, Georgia Institute of Tech. Chair: Devaraj, Arun, Pacific Northwest Company Hinkle, Christopher, Univ. of Texas at Dallas National Laboratory Warren, James, National Institute of Ohlhausen, James A. (Tony), Sandia Bagot, Paul, Oxford University, UK Standards and Technology (NIST) National Laboratories Cairney, Julie, Univ. of Sydney, Australia Ramana, Chintalapalle, University of Perea, Daniel, Pacific Northwest National Actinides and Rare Earths Focus Topic Texas at El Paso Laboratory Chair: Tobin, James, Lawrence Livermore Stueber, Michael, Karlsruhe Institute of Prosa, Ty, CAMECA National Laboratory Technology, Germany Thevuthasan, Suntharampillai, Qatar Bagus, Paul, University of North Texas Environ. and Energy Res. Institute, Qatar Wei, David, University of Florida Booth, Corwin, Lawrence Berkeley Vurpillot, Francois, Univ. of Rouen, France National Laboratory 2 Dhayal, Marshal, CSIR Centre for Cellular and Molecular Biology (CCMB), India Ghodssi, Reza, University of Maryland, Helium Ion Microscopy Focus Topic College Park Chair: Hlawacek, Gregor, HelmholtzGousev, Evgeni, Qualcomm MEMS Zentrum Dresden - Rossendorf, Germany Technologies, Inc. Co-Chair: Gölzhäuser, Armin, University Hiebert, W.K., University of Alberta and of Bielefeld, Germany The National Institute for Livengood, Richard, Intel Corporation Nanotechnology, Canada Notte, John A., Carl Zeiss Microscopy Ilic, Robert, National Institute of Standards and Technology (NIST) In-Situ Spectroscopy and Microscopy Kotru, Sushma, The Univ. of Alabama Focus Topic Krylov, Slava, Tel Aviv University, Israel Co-Chair: Nonnenmann, Stephen, Maboudian, Roya, University of California University of Massachusetts - Amherst Co-Chair: Tao, Franklin (Feng), University at Berkeley Metzler, Meredith, Cornell University of Notre Dame Co-Chair: Yang, Judith, Univ. of Pittsburgh Ng, Tse Nga (Tina), PARC (Palo Alto Research Center), a Xerox Company Co-Chair: Yu, Xiao-Ying, Pacific Sumant, Anirudha, Argonne National Lab Northwest National Laboratory Thundat, Thomas, University of Alberta IPF on Mesoscale Science and and The National Institute for Technology of Materials and Nanotechnology, Canada Metamaterials (IPF) Tian, Wei-Cheng, National Taiwan Co-Chair: Ludeke, Rudy, IBM Emeritus University, Taiwan, Republic of China Co-Chair: Rogers, Bridget R., Vanderbilt Nanometer-scale Science and Technology University Chair: Nogami, Jun, University of Toronto, Murday, James, University of Southern Canada California Arnault, Jean-Charles, CEA LIST, France Magnetic Interfaces and Nanostructures Baykara, Mehmet Z., Bilkent University Chair: Szulczewski, Greg, The University Borovsky, Brian P., St. Olaf College of Alabama Burnham, Nancy, Worcester Polytechnic Donath, Markus, Muenster Univ., Germany Institute Enders, Axel, Univ. of Nebraska Lincoln Chang, Chan-Yuen, National Tsing Hua Ohldag, Hendrik, SLAC National University Accelerator Laboratory Chang, Huan-Cheng, Academia Sinica, Taiwan Manufacturing Science and Technology Cohen, Sidney, Weizmann Institute of Chair: Rogers, Bridget R., Vanderbilt Science, Israel University Evoy, Stephane, University of Alberta Butler, Stephanie, Texas Instruments Henry, Larry, Southern University Diebold, Alain, SUNY College of and A&M College Nanoscale Science and Engineering Ocola, Leonidas, Argonne National Lab. Hu, Liangbing, University of Maryland, Prater, Craig, Anasys Instruments College Park Murday, James, Univ. of Southern California Robinson, Jeremy, Naval Research Lab. Seifu, Dereje, Morgan State University Rubloff, Gary, University of Maryland, Shenderova, Olga, Adámas College Park Svedberg, Erik B., The National Academies Nanotechnologies Inc. Wei, David, University of Florida Materials Characterization in the Willey, Trevor, Lawrence Livermore Semiconductor Industry Focus Topic National Laboratory Chair: van der Heide, Paul, Novel Trends in Synchrotron and FELGLOBALFOUNDRIES, NY, USA Co-Chair: Diebold, Alain, SUNY College Based Analysis Focus Topic Chair: Rudolf, Petra, University of of Nanoscale Science and Engineering Groningen, The Netherlands MEMS and NEMS Dürr, Herrmann, Stanford University Chair: Feng, Philip, Case Western Reserve Mårtensson, Nils, Uppsala Univ., Sweden University Plasma Science and Technology Co-Chair: Burkett, Susan, The University Chair: Joseph, Eric A., IBM Research of Alabama Division, T.J. Watson Research Center Blain, Matthew, Sandia National Lab. Davis, Robert, Brigham Young University Agarwal, Ankur, Applied Materials Inc. Agarwal, Sumit, Colorado School of Mines Exhibitor Technology Spotlight Chair: DeGennaro, Jeannette, AVS 2 Booth, Jean-Paul, LPP-CNRS, Ecole Polytechnique, France Chang, Jane P., University of California at Los Angeles Despiau-Pujo, Emilie, LTM, France Hamaguchi, Satoshi, Osaka Univ., Japan Hsu, Cheng-Che, National Taiwan University, Taiwan, Republic of China Huffman, Craig, Sematech Johnson, Erik, LPICM-CNRS, Ecole Polytechnique, France Nozawa, Toshihisa, Tokyo Electron Ltd., Japan O'Connell, Deborah, University of York, UK Park, Chanro, GLOBALFOUNDRIES Reniers, François, Université Libre de Bruxelles, Belgium Sankaran, Mohan, Case Western Reserve Univ. Sriraman, Saravanapriyan, Lam Research Corp Srivastava, Aseem K., Applied Materials, Inc. Tatsumi, Tetsuya, Sony Corporation, Japan van de Sanden, Mauritius C.M., Dutch Institute for Fundamental Energy Research (DIFFER), Netherlands Vitale, Steven, MIT Lincoln Laboratory Wolden, Colin, Colorado School of Mines Yeom, Geun Young, Sungkyunkwan University, Republic of Korea Scanning Probe Microscopy Focus Topic Chair: Li, An-Ping, ORNL Co-Chair: Allen, Stephanie, The University of Nottingham, UK Co-Chair: de Lozanne, Alex, University of Texas at Austin Co-Chair: Kim, Tae-Hwan, Pohang Univ. of Science and Tech., Republic of Korea Co-Chair: Nogami, Jun, University of Toronto, Canada Co-Chair: Ventrice, Jr., Carl, University at Albany-SUNY Selective Deposition as an Enabler of Self-Alignment Focus Topic Chair: Clendenning, Scott, Intel Chabal, Yves, University of Texas at Dallas Fischer, Pamela, ASM Ma, Paul, Applied Materials, Inc. Parsons, Gregory, North Carolina State Univ. Smythe, John, Micron Technology Spectroscopic Ellipsometry Focus Topic Chair: Hofmann, Tino, University of Nebraska-Lincoln Aspnes, David, North Carolina State Univ Creatore, Mariadriana, Eindhoven University of Technology, Netherlands Diebold, Alain, SUNY College of Nanoscale Science and Engineering Dong, Xia, Eli Lilly and Company Filler, Michael, Georgia Institute of Tech. Fujiwara, Hiroyuki, Gifu Univ., Japan Hilfiker, James, J.A. Woollam Co., Inc. Hingerl, Kurt, University Linz, Austria Liu, Shiyuan, Huazhong University of Science and Technology, China Losurdo, Maria, University Bari, Italy Schubert, Mathias, University of NebraskaLincoln van der Heide, Paul, GLOBALFOUNDRIES, NY, USA Wormeester, Herbert, University of Twente, Netherlands Zollner, Stefan, New Mexico State Univ. Thin Film Chair: Scarel, Giovanna, James Madison University Co-Chair: Creatore, Mariadriana, Eindhoven Univ. of Technology, Netherlands Adams, David, Sandia National Labs Allred, David, Brigham Young University Anguas-Gil, Angel, Argonne National Lab Cavanagh, Andrew, University of Colorado, Boulder Surface Modification of Materials by Conley, John, Oregon State University Plasmas for Medical Purposes Focus Davidson, Mark, University of Florida Topic Eklund, Per, Linkoping Univ., Sweden Chair: Hamaguchi, Satoshi, Osaka Fitz-Gerald, James, University of Virginia University, Japan George, Steven, Univ. of Colorado, Boulder Arefi-Khonsari, Farzaneh, l'université Ghosh, Avik, University of Virginia Pierre et Marie Curie, France Grubbs, Robert, Micron Technology Graves, David, Univ. of California, Guisinger, Nathan, Argonne National Lab Berkeley Gupta, Subhadra, University of Alabama Joseph, Eric A., IBM Research Division, Irving, Douglas, North Carolina State Univ. T.J. Watson Research Center Jones, Sean, OSTP/NSF Leggett, Graham, Univ. of Sheffield, UK Jur, Jesse, North Carolina State University O'Connell, Deborah, Univ. of York, UK Karabacak, Tansel, University of Arkansas Pacholski, Michaeleen, The Dow Chemical at Little Rock Company Kessels, Erwin, Eindhoven University of Technology, Netherlands Surface Science Chair: Bartynski, Robert, Rutgers, the State Kim , Hyungjun, Yonsei Univ., Korea Kumah, Divine, Yale University University of New Jersey Bartels, Ludwig, University of California - Lewis, Jay, RTI International Ntwaeaborwa, OdirilengMartin, Univ. of Riverside the Free State, South Africa Gellman, Andrew, Carnegie Mellon Univ. Kay, Bruce, Pacific Northwest National Lab. Parsons, Gregory, North Carolina State University Koel, Bruce, Princeton University Poodt, Paul, Holst Centre /TNO Rahman, Talat, Univ. of Central Florida Netherlands Sutter, Peter, Brookhaven National Lab Rack, Philip, The Univ. of Tennessee Tysoe, Eddy, Univ. of WisconsinKnoxville Milwaukee Rieth, Loren, University of Utah Utz, Arthur, Tufts University Rossnagel, Stephen M., IBM T.J. Watson Research Center Steiner, Matthew, University of Virginia Vallee, Christophe, LTM-CEA/LETI, France Vanfleet, Richard, Brigham Young Univ. Zuilhof, Han, Wageningen Univ., Netherlands Tribology Focus Topic Chair: Schall, J. David, Oakland Univ. Argibay, Nicolas, Sandia National Labs. Irving, Douglas, North Carolina State Univ. Jacobs, Tevis, University of Pittsburgh Mangolini, Filippo, University of Pennsylvania Vacuum Technology Chair: Garcia, Bob, SAES Getters Arnold, Paul, MKS Instruments, Inc., Granville-Phillips Product Center Becker, Joe, Kurt J. Lesker Company Borichevsky, Steve, Applied Materials, Varian Semiconductor Equipment Brucker, Gerardo, Granville-Phillips Vacuum Products Fedchak, James, National Institute of Standards and Technology (NIST) Hendricks, Jay, National Institute of Standards and Technology Li, Yulin, Cornell University Martinez, Ted, SLAC National Accelerator Lab Peacock, Neil, MKS Instruments Ricker, Jacob, NIST Stutzman, Marcy, Thomas Jefferson National Accelerator Facility Wang, Lily, Los Alamos National Laboratory Wüest, Martin, INFICON Ltd., Liechtenstein ****************************************************************************************** FOCUS TOPICS 2D MATERIALS FOCUS TOPIC (2D): The 2D Materials focus topic will review the world wide effort in exploring the fundamental properties of emerging 2D Materials, their synthesis, characterization, processing and applications. The papers are solicited in such areas as 2D materials growth and processing; electronic, optical, magnetic, mechanical, and thermal properties; charge and spin transport; characterization by microscopy and spectroscopy; surface chemistry and plasma processing; dopants, defects and interfaces; nanoribbons, 2D heterostructures; applications in nanoelectronic devices, sensors, spintronics, optoelectronics, and photonics; novel quantum phenomena in 2D materials. 2D1+SS+NS+PS+EM+TF+SP 2D Materials: Growth and Fabrication Joshua Goldberger, Ohio State University, “Atomically-Thin 2D Layers of Group IV Semiconductors” Arend van der Zande, Columbia University, “Controlled Interfaces in 2D Materials” 2D2+NS+MS+EM+MC 2D Materials: Devices and Applications Cory Dean, Columbia University Peide Ye, Purdue University, "Device Applications of 2D Narrow Bandgap Semiconductors" 2D3+SS+NS+TF+MN+SP Mechanical and Thermal Properties of 2D Materials Zenghui Wang, Case Western Reserve University, "Nanoelectromechanical Systems based on 2D Materials Beyond Graphene" 2D4+SS+NS+EM+TF+MI+SP+MC Electronic and Magnetic Properties of 2D Materials Zahid Hasan, Princeton University, "Electronic Structure of Novel 2D Materials with Enhanced Functionalities" Andrea Young, University of California at Santa Barbara, "Isospin Ferromagnetism in Graphene Heterostructures" 3 2D5+SS+NS+EM+IS+SP+MC Dopants and Defects in 2D Materials An-Ping Li, ORNL, "Defects and Boundaries in 2D Materials: Correlating Electronic Properties to Atomic Structures" Oleg Yazev, Ecole Polytechnique Fédérale de Lausanne (EPFL), "Polycrystalline 2D Materials: Atomic Structure and Electronic Transport Properties" 2D6+SS+NS+EM+TF Optical and Optoelectronic Properties of 2D Materials Thomas Mueller, Vienna University of Technology, "2D Materials and Heterostructures for Applications in Optoelectronics" Xiaobo Yin, University of Colorado, Boulder, "Nonlinear Optical Spectroscopy of 2D Semiconductor Monolayers" 2D7+SS+NS+PS+EM+IS+SP Surface Chemistry of 2D Materials: Functionalization, Membranes, Sensors Partick Soukiassian, Commissariat à l'énergie atomique et aux énergies (CEA), "Selective Nanochemistry on Graphene/Silicon Carbide: Nanotunnels Formation & Possible Prebiotic Root of Life in the Universe" 2D8+SS+NS+EM+TF+MG Heterostructures of 2D Materials Judy Cha, Yale University, "Direct Synthesis of 2D van der Waals Heterostructures" Feng Wang, University of California at Berkeley, “Probing Valley Physics in Atomically Thin 2D Materials” 2D9+SS+NS+EM+TF+SE+SM+MG Emergent 2D Materials Stefan Foerster, Universität Halle, "A Two-Dimensional Oxide Quasicrystal" Michael Naguib, Oak Ridge National Laboratory, "Two-Dimensional Early Transition Metal Carbides and Carbonitrides "Mxenes:" Synthesis, Properties and Applications" Peter Sutter, Brookhaven National Laboratory, "Toward Novel 2D Materials: Graphene Nano-heterostructures and Unconventional Metal Dichalcogenides" 2D10 2D Materials Focus Poster Session ACCELERATING MATERIALS DISCOVERY FOR GLOBAL COMPETITIVENESS FOCUS TOPIC (MG): Worldwide, global competitiveness is being sought through materials innovation and a reduction in the time to production. Japan started the Funding Program for World-Leading Innovative R&D on Science and Technology (FIRST) in 2009. Singapore has funded a National Framework for Innovation and Enterprise. In Europe, materials are viewed as a key enabler for boosting industrial and technological growth. Materials design and innovation have been a central focus. In the United States, this effort is captured by Materials Genome Initiative (MGI) (http://www.whitehouse.gov/mgi). In the same way that the Human Genome Project accelerated a range of biological sciences by identifying and deciphering the basic building blocks of the human genetic code, MGI can accelerate our understanding of the fundamentals of material science, providing a wealth of practical information that entrepreneurs and innovators will be able to use to develop new products. The presentations associated with this focus topic discuss progress in integrating efforts in computation, data informatics and experimentation. In the MG sessions speakers from around the world will provide examples of their work that reflects the knowledge base that they have created to advance the discovery and development of materials with specific and desired functions or properties from first principles in combination with experiments and simulations. In many cases this is accomplished by understanding the interrelationships of composition, structure, properties, processing, and performance. Modeling, analysis, and computational simulations are validated and verified through synthesis, characterization, and device demonstration. Examples will consist of high throughput calculations of material properties for developing design rules, assembly of experimental observations that lead to rational designing, new data analytic tools and statistical algorithms, advanced simulations of material properties, new device functionality and advances in predictive modeling that leverage machine learning, data mining, and sparse approximation. MG1+BI+NS+TF+MS Design and Discovery (Bio and Other Interfaces) Mark Bradley, University of Edinburgh, UK, "Polymer Microarrays - High Throughput Methods for Bio-material Discovery for the Control and Modulation of Stem Cells and Translational Application" Jacqueline Cole, University of Cambridge, UK, “Molecular Engineering of New Optoelectronic Materials via Rational Design” Altaf Karim, COMSATS University, Islamabad, Pakistan, “Accelerating the Discovery of Alternative Fuel Catalysts through Intelligent Computational Framework” Cyrus Wadia, Office of Science and Technology Policy MG2+MI+2D+NS+TF Development of Novel Materials Ramamurthy Ramprasad, University of Connecticut, "Rational Accelerated Design of Polymer Dielectrics" Andrew Rappe, University of Pennsylvania, “Controlled Spontaneous Nanoscale Patterning of Nonstoichiometric Reconstructions for Catalysis and Light Harvesting” Eva Zurek, University at Buffalo-SUNY, "Developing Evolutionary Algorithms for Crystal Structure Prediction and their Application towards Materials under Conditions of Extreme Pressure" MG3 Accelerating Materials Discovery for Global Competitiveness Poster Session ACTINIDES AND RARE EARTHS FOCUS TOPIC (AC): Actinides and Rare Earths exhibit many unique and diverse physical, chemical and magnetic properties, due in large part to the complexity of their 5f and 4f electronic structure. These Special Topic Sessions will concentrate upon the chemistry, physics and material science in the Lanthanide and Actinide materials, driven by the 4f and 5f electronic structure. Particular emphasis will be placed upon the 4f/5f magnetic structure, surface science and thin film properties and their applications to energy related issues. For the actinides, fundamental actinide science and its role in resolving technical challenges posed by actinide materials will be stressed, particularly with regard to energy applications, including energy generation, novel nuclear fuels and structural materials, waste remediation and waste disposal. Both basic and applied experimental approaches, including synchrotronradiation-based and neutron-based investigations, as well as theoretical modeling computational simulations, are to be part of the Special Sessions. Of particular importance are the issues connected to potential renaissance in Nuclear Energy, including fuel synthesis, oxidation, corrosion, intermixing, stability in extreme environments, prediction of properties via bench-marked simulations, separation science, environmental impact and disposal of waste products. Potentially, the shared sessions will be with MIND, Surface Science, Thin Films, Applied Surface Science, Synchrotron Radiation, and Energy Frontiers. This would be the 6th AC Focus Topic at the AVS Symposia. The previous ones were at Albuquerque (1), Nashville (2), Tampa (3),Long Beach (4) and Baltimore (5). AC1+AS+MI Magnetism, Complexity and Superconductivity in the Actinides and Rare Earths Krzysztof Gofryk, Idaho National Laboratory, "Transport and Magnetism of 4f and 5f Systems: What we can Learn from Thermoelectric Power" Marc Janoschek, Los Alamos National Laboratory, "The Valence-Fluctuating Ground-State of δ-Pu”" Julie Staunton, Warwick University, United Kingdom of Great Britain and Northern Ireland, "Disordered Local Moments and Valence Electrons in Rare Earth Intermetallics: Magnetic Order and Interactions from an Ab-initio Electronic Structure Theory" Evgeniya Tereshina, Institute of Physics, Academy of Sciences of the Czech Republic, Czech Republic, "Exchange Bias in Heterostructures based on UO2" AC2+AS+MI Nuclear Power Issues Claude Degueldre, Paul Scherrer Institut, Switzerland, "Actinides in Irradiated Fuel: Redox Properties" Melissa Denecke, University of Manchester, United Kingdom of Great Britain and Northern Ireland, "Applications of Synchrotron Methods to f element Research in the Nuclear Fuel Cycle" Alex Landa, Lawrence Livermore National Laboratory, "Ab Initio Study of Advanced Metallic Nuclear Fuels for Fast Breeder Reactors" AC3+AS+MI Chemistry and Physics of the Actinides and Rare Earths Albert Migliori, Los Alamos National Laboratory, "Ultra Sound Measurements of Actinide Materials" David Shuh, Lawrence Berkeley National Laboratory, "Soft X-ray Spectromicroscopy of Actinide Materials" Tonya Vitova, Karlsruhe Institute of Technology, Germany, "High Resolution X-ray Absorption Spectroscopy as an Advanced Tool for Structural Investigations of Actinides" AC4+AS+MI Poster Session ADDITIVE MANUFACTURING/3D PRINTING (AM): The new Focus Topic on Additive Manufacturing (also known as 3D Printing) will be an AVS-wide interdisciplinary forum which will review the world wide effort in exploring the fundamental issues in the fabrication of parts which are not possible using conventional methods. The Focus Topic will cover: applications, materials used, and processes employed. The Focus topic will also discuss the characterization of properties (of both the final product and the starting materials). Abstracts are solicited in such areas as; ink-jet printing (including bio-printing), laser sintering (selective and direct), fused deposition, finishing issues, multiple material systems, efficiency, sintering, phase transitions, microstructure control, droplet control, and additive fabrication for electronic devices and systems. The organizers of this Focus Topic will bring together a broad coalition of scientists who strive to understand the scientific phenomena affecting the usage of metals, ceramics and polymers in future manufacturing, as well as to provide a forum to discuss the recent advances in the application of additive manufacturing. Talks will highlight past achievements in the field as well as future strategies. AM1+EM+MS+TF Materials for Additive Manufacturing Anthony DeCarmine, Oxford Performance Mat., "High Performance Additive Manufacturing (HPAM) - Direct Fabrication of Fully Functional, Mission Critical Devices" Michael W. Peretti, General Electric Aviation, "Material Considerations and Opportunities for Laser Powder Bed Additive Manufacturing" AM2+EM+MS+TF Applications and Processes for Additive Manufacturing Phill Dickens, University of Nottingham, UK, "The Future of Additive Manufacturing and Multifunctional Parts" Douglas C. Hofmann, California Institute of Tech., “Innovation in Metals and Manufacturing: 3D Printing and Beyond” Ryan Wicker, University of Texas at El Paso, "Printing Multi-Functionality using Additive Manufacturing" AM3+EM+MS+TF Microstructure, Finish and Considerations for the Final Product Jennifer Fielding, AFRL (NAMII), "Print and Fly: Additive Manufacturing for Aerospace Applications - Possibilities and Hurdles to Overcome" AM4+EM+MS+TF+AS Growth, Multiple Materials, Control and Characterization Teresa J Clement, Raytheon Company, "Additive Manufacturing Enabling Advanced Technologies" AM5+MS+EM Additive Fabrication for Electronic Devices and Systems Ana Claudia Arias, UC Berkeley, "Additive Printing Techniques for Flexible Electronic Devices" Eugene Chow, PARC (Palo Alto Research Center), "Digital Microassembly for High-performance Printed Electronics" Michael McAlpine, Princeton University, "3D Printed Bionic Nanomaterials" AM6 Additive Manufacturing/3D Printing Poster Session ATOM PROBE TOMOGRAPHY FOCUS TOPIC (AP): Atom Probe Tomography: Atom Probe Tomography (APT) is an evolving technique based on field ion microscopy and time-offlight mass spectrometry that can provide quantitative three-dimensional compositional imaging and analysis of a volume of approximately 100x100x500 nm3 with part-per-million sensitivity and sub-nanometer spatial resolution. Atom probe tomography is very much complementary with established surface-sensitive and bulk analysis techniques such as SIMS, Auger analysis, while at the same time excels by achieving a spatial resolution close to high resolution transmission electron microscopy, although in 3D. This unique capability, combined with correlative electron microscopy, is helping to understand phenomena such as grain boundary segregation and diffusion, materials degradation and failure, microstructural evolution, defect migration and cluster formation, and nucleation and growth of materials with buried interfaces through 3D chemical imaging. The organizers of this Focus Topic symposium seek to bring together a broad coalition of scientists who apply 3D atom probe tomography to understand interfacial and nanoscale science phenomena in metals, semiconductors, insulators and soft materials, as well as to provide a forum to discuss the recent advances in the application of APT. This discussion will be facilitated by highlighting past achievements in the field and by discussing current experimental results along with the future developments. AP1+NS+AS+MI+MC Atom Probe Tomography of Nanomaterials Dieter Isheim, Northwestern University Taisuke Sasaki, National Institute for Materials Science, Japan, “Correlative Multi-scale Analysis of Nd-Fe-B Permanent Magnet” AP2+AS Atom Probe Tomography Applications to Engineering Alloys Sophie Primig, Montanuniversität Leoben, Austria, “Combining Atom Probe Tomography with TKD and FiB for Comprehensive Characterization of High Performance Materials” Mattias Thuvander, Chalmers, Sweden, “APT Studies of the Embrittlement of Fe-Cr Ferrite” AP3+AS Correlative APT and Other Spectroscopy/Microscopy Chang Gyung Park, POSTECH, Republic of Korea, “APT & TEM Observations on the Local Crystallization of NbO2 used in Switching Devices” Lorenzo Rigutti, University of Rouen, France, “Correlating Atom Probe Tomography with High-Resolution Scanning Transmission Electron Microscopy and Micro-Photoluminescence Spectroscopy: The Case of III-Nitride Heterostructures” AP4+AS New Applications of Atom Probe Tomography Stephan Gerstl, ETH Zürich, Switzerland, “Using Aqueous Solutions by Cryo-Fixation As a Matrix for Analyzing Materials in Apt” Daniel Schreiber, Pacific Northwest National Laboratory, “Development of Atom Probe Tomography for Studying Nuclear Corrosion Issues” AP5 Atom Probe Tomography Poster Session ENERGY FRONTIERS FOCUS TOPIC (EN): The Energy Frontiers Focus Topic provides a forum for interdisciplinary, cutting-edge research centered on energy conversion and storage. This year’s agenda focuses on solar energy conversion, including both photovoltaics and photocatalysis, as well as energy storage using batteries and supercapacitors. All abstracts related to these topics will be considered. Emphasis is on fundamental and applied research related to surfaces, interfaces, materials, and devices for energy conversion and storage. Experimental, theoretical, and computational studies are welcome. The Energy Frontiers Focus Topic will host three oral sessions and one poster session. “Solar cells” includes thin film, crystalline Si, and nanostructured varieties, with particular interest in emerging materials such as perovskites. “Photocatalysis” includes all solar fuels, especially photoelectrochemical and photocatalytic hydrogen production by water splitting. “Batteries and Supercapacitors” includes applications in Li-based and non-Li charge storage devices. The EN program features oral sessions on each of these topics as well as a poster session encompassing all areas of energy conversion and storage. EN also co-sponsors 14 energy-related sessions hosted by the EMPD, IS, NSTD, SE, SS, and TF Divisions and Focus Topics. Highlights of the Energy Frontiers program will include talks by renowned invited speakers from academia, industry, and national laboratories. EN1+SS+NS+EM+TF+SE+AS Solar Cells Nam-Gyu Park, Sungkyunkwan University, Korea, "Perovskite Solar Cell: From Materials to Devices" Kaushik Roy Choudhury, DuPont Central Research and Development, “Non-Vacuum Processing of Sustainable Semiconductors for Thin-Film Photovoltaics” EN2+SS+EM+SE+AS Photocatalysis Joel Ager, Lawrence Berkeley National Laboratory, "Sustainability Challenges for Solar Hydrogen Production" Thomas Jaramillo, Stanford Univ., "Engineering Surfaces and Interfaces for Photoelectrochemical (PEC) Water-Splitting" EN3+SS+NS+EM+TF+SE Batteries and Supercapacitors Marca Doeff, Lawrence Berkeley National Laboratory, "Behavior of Layered Cathode Materials: A Route to Higher Energy Density for Li-Ion Batteries" Debra Rolison, Naval Research Lab., "The Road beyond Lithium Batteries Is Paved—In Three Dimensions—with Zinc" EN4 Energy Frontiers Poster Session HELIUM ION MICROSCOPY FOCUS TOPIC (HI): The Focus Topic on Helium Ion Microscopy (HIM) provides a forum for scientists working with Gas Field Ion Source (GFIS) Microscopes and those interested in its prospects and capabilities. This technique is used by researchers and engineers from different fields such as materials science, semiconductor industry and nanotechnology, as well as life science and biotechnology. An HIM is capable of imaging conductive as well as insulating samples without special treatment at nanometer resolution. Alternatively, using Neon instead of Helium gas during GFIS operation, nanostructures can be engineered with unprecedented precision and reduced collateral damage. Due to AVS attendance by an interdisciplinary group of scientist, this conference is well suited to disseminate the potential of HIM. The focused topic covers all aspects of science currently explored with the HIM, ranging from fundamental ion matter interactions to image formation and contrast mechanisms to materials imaging, bioimaging and lithography and high resolution materials modification at the nano scale. A Poster session will be held to present the newest results in the field and allow for a more detailed presentation of the findings. The best posters will be highlighted during the oral sessions in the form of short hot topic presentations. HI1+SS+AS Fundamentals of Helium Ion Microscopy Torgny Gustafsson, Rutgers University, "Is Elemental Identification Possible in the Helium Ion Microscope?" Tom Wirtz, Centre de Recherche Public – Gabriel Lippmann, Luxembourg, "SIMS on the Helium Ion Microscope: A Powerful Tool for High-resolution High-sensitivity Nano-analytics" HI2+NS+AS Imaging and Milling with He and Ne Ion Beams Shane Cybart, University of California, San Diego, "Josephson Superconducting Tunnel Junctions in Y-Ba-Cu-O Directly Patterned with a Focused Helium Ion Beam" HI3 More Moore: Nanoengineering for Nanoelectronics Shida Tan, Intel Corporation, "GFIS in Semiconductor Applications" HI4 Aspects of Helium Ion Microscopy Poster Session IPF ON MESOSCALE SCIENCE AND TECHNOLOGY OF MATERIALS AND METAMATERIALS (IPF): The The Industrial Physics Forum (IPF) is an American Institute of Physics (AIP) sponsored conference that is hosted by the AIP member societies. The 2015 Forum is the sixth held at the AVS and is a two-day event of solely invited talks. Mesoscale science encompasses the domain where a physical description in terms of macroscopic classical concepts becomes inadequate and where a description in terms of the discreet atomic nature of materials and structures fails because of system complexity in terms of component heterogeneity and component size. The goal of mesoscale technology is to harness the wealth of variables in composition, chemical bonding, dimensionality, size and architecture to create structures of predetermined functionality that not only can supplant existing technologies, but can create structures and devices with new capabilities for diverse applications. Included here are the synthetic solids referred to as metamaterials, assemblies of equivalent multi-atomic units which functionally assume a role analogous to those of individual atoms in regular solids, but collectively exhibit new properties and functionalities. The realization of the full potential of mesoscale devices and structures requires not only innovation in synthesis and assembly of multi-atomic elements at various hierarchical levels, but also further refinements in and development of new diagnostic tools, as well as substantial advances in theoretical and computational methods with acceptable predictive capabilities. IPF1+MS Metamaterials Federico Capasso, Harvard University, "Flat Optics based on Metasurfaces: Molding Wavefronts and Surface Waves" Nader Engheta, University of Pennsylvania, "Quest for Extreme Photonics" Tony Heinz, Columbia University, "2D Materials: Graphene and Beyond" IPF2+MS Mesoscale Phenomena in the Biosciences Anna Balazs, University of Pittsburgh, "Using Mesoscale Modeling to Design Materials That Compute" Angela Belcher, MIT William Bentley, University of Maryland, "The Convergence of Synthetic Biology and Biofabrication: Guiding Biological Function at the Mesoscale" Gerry McDermott, University of California, San Francisco, "Mesoscale Imaging in Cell Biology" IPF3+MS Materials for Energy Generation and Storage William Carter, HRL Laboratories, LLC, "Ultralight Microlattices: Defining the Limits of Lightweight Materials" San Bok Lee, University of Maryland, "Synthesis and Behavior of Nanostructures in Mesoscale Architectures" Eli Yablonovitch, Univ. of California, Berkeley, "Regenerative Thermo-PhotoVoltaics; Ultra-Efficient Power for Vehicles" IPF4+MS Degradation Science Paul Braun, University of Illinois at Urbana-Champaign, "Engineered 3D Mesoscale Battery Electrodes: Opportunities and Issues" Roger French, Case Western Reserve University, "Mesoscale Evolution & Temporal Analytics of Photovoltaic Energy Materials" Anthony Rollett, Carnegie Mellon University, "From Dislocations to Fatigue Cracks: Applications of Crystal Plasticity in 3D" IPF5+MS Solvation Shell Advances Kristin Persson, Lawrence Berkeley National Laboratory, "A Materials Genome Approach to Design of Novel Materials and Liquids for Energy Conversion and Storage" Henry White, University of Utah, "Electric Double Layer-Limited Operation of Solid-State Thin Film Batteries" IPF6+MS Frontiers in Physics IN-SITU SPECTROSCOPY AND MICROSCOPY FOCUS TOPIC (IS): Exploration of material structure and chemistry under real conditions using different spectroscopic and microscopic techniques is critical for correlating structure and chemistry of materials to functions they perform toward development of new materials. This focused symposium presents current capabilities of in-situ characterization techniques, new structure and chemistry revealed with analytical advances, and the evolving new microscopic and spectroscopic techniques in material sciences, biological interphases, or energy storage with diverse applications. Topics of particular interest include: Ambient pressure x-ray photoelectron spectroscopy and the revealed surface chemistry; Environmental TEM and the visualized evolution of structure of materials in gas and liquid phases; X-ray absorption spectroscopy and chemical and structural information of materials under reaction condition; In-situ vibrational spectroscopy and identity of absorbates and surfaces; Ambient pressure STM and surface structure at atomic scale under reaction conditions; Evolving new analytical techniques of materials and surfaces, and chemical and structure of material and devices under working conditions; and Mesoscale imaging using microfluidics and nanofluidics. IS1+AS+SS Fundamental Studies of Surface Chemistry of Single Crystal and Nanomaterials under Reaction Conditions Fabio Ribeiro, Purdue University Gabor Somorjai, University of California, Berkeley, “Hot Electron In-Situ Surface Chemistry at Oxide-Metal Interfaces. Foundations of Acid-Base Catalysis” IS2+AS+SS+SA Ambient Pressure X-ray Photoelectron Spectroscopy Studies for Catalytic and Energy Materials in Gas Phase Robert Schlögl, Fritz-Haber-Institut der Max-Planck-Gesellschaft, Germany IS3+AS+SS+SA Ambient Pressure X-ray Photoelectron Spectroscopy Studies for Catalytic and Energy Materials in Liquid Phase John Hemminger, University of California Irvine, “Solvation and Chemistry at the Interface: Near Ambient Pressure Electron Spectroscopy Studies of Aqueous Solution Interfaces” Miquel Salmeron, Lawrence Berkeley National Laboratory IS4+AS+SS Environmental TEM Studies for Catalytic and Energy Materials Peter Crozier, Arizona State University Seiji Takeda, Osaka University, “Environmental TEM of Catalyst Materials using a Spherical Aberration Corrector” IS5+AS+SS+SA X-ray Absorption Spectroscopy and Optical Spectroscopy for Catalytic and Energy Materials Peng Chen, Cornell University, “Single-molecule Imaging of Photoelectrocatalysis in Water Oxidation” Anatoly Frenkel, Yeshiva University, “Operando Studies of Dynamic Restructuring of Working Catalysts by Correlated I Imagingand Spectroscopy Probes” IS6+AS+SS+NS+EN In-situ Scanning Tunnelling Microscopy and Vibrational Spectroscopy Studies for Catalytic and Energy Materials in Gas Phase Miguel A. Bañares, Instituto de Catálisis y Petroleoquímica, “Combining Operando Raman Spectroscopy with Other Spectroscopies and with Computational Approaches to Understand Structure-performance Relationships in Catalysis” Zili Wu, Oak Ridge National Laboratory, “In situ Vibrational Spectroscopy Investigation of the Surface Dependent Redox and Acid-base Properties of Ceria Nanocrystals” IS7 IS7+SS+NS+AS+EN+SP In Situ AFM Studies of Local Phenomena under Extreme Perturbing Environments Xiaoqing Pan, University of California, Irvine, “Probing the Dynamic Behavior of Nanostructured Materials with Atomic Resolution in Real Time” Bilge Yildiz, Massachusetts Institute of Technology, “In situ Scanning Tunneling Microscopy Studies of Perovskite Oxide Surfaces for Oxygen Electrocatalysis” IS8+SS+NS+BI+VT+MN+AS In situ Imaging of Liquids using Microfluidics James Evans, Pacific Northwest National Laboratory, “In-situ Multimodal Biological Imaging using Micro- and Nanofluidic Chambers” Bernd Winter, Helmholtz-Zentrum Berlin für Materialien und Energie/Elektronenspeicherring BESSY II, Germany, “Ultrafast Proton and Electron Dynamics in Core-Level Ionized Aqueous Solution” IS9 In-Situ Spectroscopy and Microscopy Poster Session MATERIALS CHARACTERIZATION IN THE SEMICONDUCTOR INDUSTRY FOCUS TOPIC (MC): The rapidly changing landscape in semiconductor device fabrication is continually pushing the frontiers of materials characterization. Some examples of these changes, albeit limited to CMOS based logic devices include: a) incorporation of strained Si technology, b) introduction of new materials such as III-V materials, HK-MGs, etc., c) the movement from planar to 3D structures, etc. With the continual miniaturization and move away from planar structures toward 3D structures comes the increased complexity in satisfying the ever increasing materials characterization needs. This Focus Topic is aimed at the latest materials characterization methods in use, or being developed, to satisfy the characterization needs. Examples include; a) new instrumentation (lab and/or fab based), b) new sample preparation protocols, d) new “hybrid approaches” (use of multiple characterization techniques that can provide information beyond the capabilities of the individual techniques alone), to c) the fabrication of new micro-scale test structures that more effectively mimic the nano-scale regions of interest. MC1 Characterization of 3D structures Zhiyong Ma, Intel Corporation, "Expanding Roles of Materials Characterization and Metrology in Advancing Moore's Law" MC2 Characterization of Strain relevant to SiGe, SMT, etc. Jean-Luc Rouviere, CEA-University Grenoble Alps, France, "Strain Measurements using Electron Beam Techniques" MC3+EL Characterization of New Materials (III-Vs, HKMG, etc.) Ken Burch, Boston College, "Preparing and Characterizing Nanoscale Topological Insulators" MC4 Materials Characterization in the Semiconductor Industry Poster Session (All areas) NOVEL TRENDS IN SYNCHROTRON AND FEL-BASED ANALYSIS FOCUS TOPIC (SA): The purpose of this topical session is to provide a forum for discussing recent developments in the characterization of material properties employing synchrotron and free electron laser radiation. The advancements involve unprecedented space, spectral and time resolution that can be achieved with ultrabright and tunable light in the X-ray, VUV or IR range. The three oral subsessions will focus on a few selected fields where this has led to important breakthroughs, namely in imaging and nanodiffraction, in magnetic dynamics, as well as generated new insights in correlated materials, organic materials and 2D solids. We solicit abstracts demonstrating the recent achievements using synchrotron and FEL-based analytical methods spanning from all types of XRF, scattering (including RIXS and CDI), spectroscopy (including XRPES and XES) and X-ray imaging and microspectroscopy (SPEM, XPEEM, SXTM, TXM). SA1 Imaging and Nanodiffraction Adam P. Hitchcock, McMaster University, Canada, “Nanoscale Chemical Imaging by Soft X-ray Spectro-microscopy and Spectro-ptychography” Gijs van der Schot, Uppsala University, Sweden, "Imaging Single Cells in a Beam of Live Cyanobacteria with an X-ray Laser" SA2 Magnetic Dynamics Gerhard Grübel, DESY, Germany, "Ultrafast Dynamics in Magnetic Systems" Alexander Reid, Stanford University, "Exploring All-optical Magnetic Switching with Resonant X-rays" SA3 New Insights in Correlated Materials, Organic Materials and 2D Solids Satoshi Kera, Chiba University, Japan, "Electronic States at Organic/Metal Interfaces Probed by Low-energy Excitation" Alessandra Lanzara, University of California, Berkeley, "Switching 2D Materials Properties with Light" Fulvio Parmigiani, Elettra-Sincrotrone Trieste, Italy, "Science-driven Requirements for Soft X-ray Free Electron Lasers" Robert Schoenlein, Lawrence Berkeley National Laboratory, "Revealing Spin Texture Dynamics in Complex Materials via Time-resolved Resonant Soft X-ray Scattering" SA4 Novel Trends in Synchrotron and FEL-Based Analysis Poster Session SELECTIVE DEPOSITION AS AN ENABLER OF SELF-ALIGNMENT FOCUS TOPIC (SD): With the realization that pattern placement will limit scaling long before devices and interconnects fail to perform intrinsically, the AVS continues to sponsor a focus topic aimed at providing a state-of-the-art perspective of self-alignment techniques. Advanced lithographic techniques in combination with self-alignment strategies such as selective deposition have the potential of providing both continued dimensional scaling and accurate pattern placement. Researchers from academia and industry are encouraged to present their work on the selective deposition of inorganic and organic thin films. Themes include selective atomic layer/chemical vapor/molecular layer deposition (w/ a special emphasis on inherently selective precursor development), selective poisoning, activation and acceleration schemes for deposition and etch, tunable incubation and inhibition strategies, fault tolerance for pattern replication techniques, geometric selectivity of deposition (e.g. conformality vs. bottom-up fill behavior) and modeling techniques aimed at evaluating the fundamental drivers for selectivity. SD1+AS+EM Fundamentals of Selective Deposition Roy Gordon, Harvard University, "Selective Deposition of Manganese and Cobalt for Interconnects" Charles Winter, Wayne State University, "Selective Growth of Transition Metal Films by Atomic Layer Deposition Using Strong Organic Reducing Agents" SD2+AS+EM+PS Process Development for Selective Deposition and Self-aligned Patterning Florian Gstrein, Intel Corporation, "Self-aligned Patterning through Selective Deposition - Progress, Challenges, and Opportunities" Suvi Haukka, ASM, Finland, "Surface Chemistry Related to Selective Deposition" SD3 SD: Selective Deposition as an Enabler of Self-Alignment Poster Session SPECTROSCOPIC ELLIPSOMETRY FOCUS TOPIC (EL): For the 7th year in a row, the AVS International Symposium will host the Spectroscopic Ellipsometry Focus Topic in 2015. The Spectroscopic Ellipsometry Focus Topic is synergistically supported by the transversal, yet complementary themes of material science and characterization, physics and chemistry principles at the basis of surface modification and (thin) film growth and novel fields of application and will host several oral sessions. The first session will feature contributions dedicated to novel applications and theoretical approaches of Spectroscopic Ellipsometry including the development of new instrumentation for imaging, mapping, high speed, and real-time data acquisition. Two other sessions will focus on new developments and applications of Spectroscopic Ellipsometry for the characterization of organic and biological materials as well as the optical characterization of nanostructures and metamaterials. The latter session will also include classical Spectroscopic Ellipsometry research and application areas like textured and periodic structures, optical coatings, and inorganic thin films. All sessions will feature presentations by highly recognized scientists in the field as well as high quality contributed presentations. EL1+EM+EN Spectroscopic Ellipsometry: Novel Applications and Theoretical Approaches Bernhard Drevillon, E. Polytechnique Paris, "Mueller Matrix Imaging Ellipsometry" EL2+EM+BI+AS Application of SE for the Characterization of Organic and Biological Materials Gang Jin, Chinese Academy of Sciences, "Biomedical Applications with Imaging Ellipsometry" EL3+SS+EM+AS+MC+SD Optical Characterization of Nanostructures and Metamaterials Vimal Kamineni, GLOBALFOUNDRIES U.S. Inc., "Spectroscopic Ellipsometry for Critical Dimensions Analysis" EL4 Spectroscopic Ellipsometry Poster Session SURFACE MODIFICATION OF MATERIALS BY PLASMAS FOR MEDICAL PURPOSES FOCUS TOPIC (SM): Plasma processing of materials or living tissues represents an ideal way to either create new or modify existing material surfaces for use in biomedical applications or to trigger biological reactions for therapeutic purposes. There are two topical categories that this Focus Topic emphasizes. One is plasma synthesis or modification of biomaterials and pharmaceuticals and the other is therapeutic use of plasmas for various wounds and diseases. The former may cover chemistry of biomaterial surfaces and biological molecules, biointerfaces, and efficacy of medical devices that are made or modified via plasma processes. The latter is a field known as plasma medicine, which discusses biological reactions of living organisms and tissues to which chemically reactive species generated by plasmas are applied. Latest interests in these categories include plasma polymerization and surface modification to increase biocompatibility of materials, plasma processes to create antimicrobial surfaces, biomimetic materials, and 3D cell scaffolds, and elucidation of biological processes triggered by plasma application. All sessions are co-sponsored by Biointerfaces (BID), Plasma Science and Technology (PSTD), and Applied Surface Science (ASSD) Divisions. SM1+BI+PS+AS Plasma Processing of Biomaterials Salvador Borrós i Gómez, Institut Químic de Sarrià, Ramon Llull University, Barcelona, Spain, "Tailoring Biomaterialscell Interaction through Reactive Surface Modifications" Hans Griesser, University of South Australia, Australia, “Plasma Processing of Biomaterials – Scope and Limitations” Masaaki Nagatsu, Shizuoka University, Japan, “Plasma Surface Functionalization of Nano-structured Materials for Biomedical Applications” Buddy D. Ratner, University of Washington, "Glow-Discharge Plasma Applications in the Biomedical Sciences" SM2+BI+PS+AS Plasma Processing of Biological/Biomimetic Surfaces Cristina Canal, Universitat Politècnica de Catalunya, Spain, "Plasma Processing of Biomimetic Surfaces for Bone Regeneration and Repair" Kevin Healy, University of California at Berkeley, “Organs on a Chip – Biointerfaces in Stem Cell Research” Mark Kushner, University of Michigan, "Matching Plasma Sources with Intended Biomedical Outcomes" SM3 Surface Modification of Materials by Plasmas for Medical Purposes Poster Session SCANNING PROBE MICROSCOPY FOCUS TOPIC (SP): The scanning probe microscopy (SPM) field has provided a family of techniques that have revolutionized our understanding of nanoscale interfacial phenomena. Now comprised of more than 20 different types of microscopy, the field has provided advanced tools that are able to image, manipulate and interrogate the functionality of surface features to the level of individual molecules and atoms. Such tools underpin the research activities encompassed by many AVS divisions. This focus topic will provide a forum for the discussion of the latest advances and novel applications made in the SPM field. Areas of particular interest include approaches to improve imaging capability, the acquisition of probe-sample interaction data, and the novel and emerging applications in physical and chemical functional imaging, particularly in spin detection and quantum information processing. These interests are reflected through invited and contributed presentations in 4 key areas, namely: (1) Advances in Scanning Probe Microscopy, (2) Probe-Sample Interactions and Emerging Instrument Formats, (3) Electron Transport and Transport Properties, and (4) Chemical Reactions at the Nanoscale. SP1+SS+NS+AS Advances in Scanning Probe Microscopy Keji Lai, University of Texas at Austin, "Probing Electrostatic Field Effect in Quantum Materials by Microwave Impedance Microscopy" Hari Manoharan, Stanford University, "Designer Electrons: Quantum Information and New Particles in Atomically Assembled Matter" SP2+SS+NS+AS+2D Probing Electronic and Transport Properties Young Kuk, Department of Physics and Astronomy, Seoul National University, "Experimental Evidence for s-Wave Pairing Symmetry in Superconducting CuxBi2Se3 Single Crystals Using a Scanning Tunneling Microscope" Brian LeRoy, University of Arizona, "Imaging and Spectroscopy of Graphene Heterostructures" SP3+SS+NS+AS Probing Chemical Reactions at the Nanoscale Zheng Gai, Oak Ridge National Laboratory, "STM Study of Magnetic Skyrmions" Pengpeng Zhang, Michigan State University, "Tailoring the Growth of Organic Thin Films via Chemical Reactions at the Molecular Scale" SP4+SS+NS+AS+MI Probe-Sample Interactions Daniel Rugar, IBM Almaden Research Center, "Progress in Nanoscale Magnetic Resonance Imaging" Weida Wu, Rutgers, the State University of New Jersey, "In situ Scanning Probe Microscopy Studies of Cross-coupled Domains and Domain Walls" SP5 Scanning Probe Microscopy Poster Session TRIBOLOGY FOCUS TOPIC (TR): The 2015 Tribology Focus Topic will feature sessions on nanoscale wear with applications in nano-metrology and nanomanufacturing, molecular origins of friction, lubricants and coatings, and friction in biological systems. Sessions are jointly sponsored by the Applied Surface Science (ASSD) Division, Thin Films (TF), Nanometer-scale Science and Technology (NSTD), and Biointerfaces (BI). Presentations will carry a materials focus in areas such as thin film deposition, solid lubricants, nanocomposites designed for tribological function, self-healing interfaces, wear-resistant polymers, and biomaterials. Contributions will consider advances in in-situ, molecularly specific, spatially resolved approaches to the quantitative characterization of tribological interfaces as well as accounts of numerical computation and molecular modeling of tribological materials and biomaterials. We have an exciting group of invited speakers including David Burris (U. Delaware) who will give a talk on cartilage tribology, James Batteas (Texas A&M) who will discuss friction in atomically thin films, and Ernst Meyer (Basel University) who will present his work on single molecule tribology. Other invited speakers include Rob Carpick, Ashlie Martini, Michael Chandross, Martin Dienwiebel and Rowena Crockett. In addition to the four oral sessions, we will have a poster session, which will provide an opportunity for personal exchange and discussion of results with colleagues. TR1+NS+AS Nanoscale Wear Applications to Nano-metrology and Manufacturing James Batteas, Texas A&M University, "Studies on the Use of Atomically Thin Films for Controlling Friction and Adhesion at Interfaces" Robert Carpick, University of Pennsylvania, “Understanding and Preventing Wear at the Nanoscale” TR2+SS+NS+AS Molecular Origins of Friction Ashlie Martini, University of California Merced, “Atomic-scale Mechanism of Single Asperity Sliding” Ernst Meyer, Basal University, "Single Molecule Experiments to Explore Friction and Adhesion" TR3+TF Lubricants and Coatings Michael Chandross, Sandia National Laboratories, "Environmental Effects on Tribology of MoS2 Films" Martin Dienwiebel, Karlsruhe Institute of Technology, “Mechanical Mixing and Wear Formation in Metallic Tribocouples” TR4+BI Friction in Biological Systems David Burris, University of Delaware, "Cartilage Tribology" Rowena Crockett, ETH, "Influence of Sugar Structure on Friction and Adhesion" TR5 Tribology Poster Session DIVISION/GROUP PROGRAMS ADVANCED SURFACE ENGINEERING (SE): The program of the Advanced Surface Engineering Division (SE) addresses both scientists as well as technologists who are interested in new thin film materials and emerging technologies to prepare them, who need to know about their characterization and who aim at their practical use. Four oral sessions, co-sponsored by other AVS Divisions and Focus Topics, and a poster session provide a well balanced mix of fundamentals and applications of surface engineering. These sessions particularly emphasize on the basics and use of atmospheric pressure plasmas, innovations in pulsed plasmas in surface engineering, new developments in nanostructured thin film and coatings, and on thin films for energy storage, conversion and harvesting. Presentations on novel coating materials, new processes for their synthesis, as well as on new approaches to their design and modeling, process diagnostics and growth control, and, property characterizations will be solicited, representing a large diversity of recent developments in surface engineering. The increasing demand of creating new knowledge and identifying advanced methods in energy storage, conversion and harvesting are also explicitly addressed. Contributions on synthesis and characterization of thin films for lithium ion batteries, photovoltaics, thermoelectrics and other topics are highly welcome. We encourage academics, scientists and technicians and especially young colleagues from all disciplines and countries to contribute to a technical program of big diversity allowing for large benefits from meeting specialist from various fields and making contacts for establishing new cooperations and partnerships. SE1+PS+SM Atmospheric Pressure Plasmas Ladislav Bardos, Uppsala University, Sweden, "Atmospheric Plasma in Liquids" SE2+PS Pulsed Plasmas in Surface Engineering Jaroslav Vlcek, University of West Bohemia, Czech Republic, "Reactive High-power Impulse Magnetron Sputtering and Pulsed Magnetron Co-sputtering of Multifunctional Films" SE3+NS+AS+TR Nanostructured Thin Films and Coatings Paul H. Mayrhofer, Vienna University of Technology, Austria, "Atomistic Guided Development of Hard Coatings for Severe Applications" SE4+EM+EN Thin Film Technologies for Energy Storage, Conversion and Harvesting Bruce Clemens, Stanford University, "Laser Liftoff of Single Crystal GaAs Thin Films and Energy Conversion Devices" SE5 Advanced Surface Engineering Poster Session APPLIED SURFACE SCIENCE (AS): The Applied Surface Science Division (ASSD) provides a forum for research in the preparation, modification, characterization, and utilization of surfaces in practical applications. Areas of interest run the gamut from nanoscience, polymers, and semiconductor processing to forensic science and biotechnology. The Division has long been the premier gathering place for the global surface analysis community. This year we mark the 30th Anniversary of the founding of our division with a technical program that both celebrates historical milestones while also addressing characterization challenges that remain outstanding and/or are critical to scientific discovery. Sessions are built around a “Top 30” list of Breakthroughs, Challenges, Memorable Interactions, and Trends that will be displayed as a poster in the Applied Surface Science Poster Session. Sessions on various aspects of Practical Surface Analysis, including Multiple Technique Approaches, Sample Preparation, and Interpretation, will include invited talks by those who helped set the standards and protocols we use today, as well as invited talks by researchers such as Dario Stacchiola, who are shedding new light on classic problems like catalysis with new technique approaches. Sessions on Sub-Micron Feature Analysis and Chemical Mapping show how far we have come in these areas, with invited talks focused on the combination of AFM technology with molecular spectroscopies, as well as continuing developments in multivariate analysis of chemical mapping data. A session on Challenges in Characterization of Polymer/Organic/Biological Samples provides an opportunity to celebrate the introduction of ToF-SIMS and the impact this technique has had and continues to have in this area. Finally, a session around Buried Interfaces will show how traditional cross-sectional analysis and elemental depth profiling have morphed into molecular depth profiling and correlated 3D imaging techniques. As a strongly characterization-centered division, ASSD is supporting the AVS Focus Topics in 2015, and will be contributing to Focus Topics in Scanning Probe Microscopy, Synchrotron-based Analysis, Spectroscopic Ellipsometry, Helium Ion Microscopy, In-Situ Spectroscopy, and Tribology. Our Thursday evening poster session will not only cover all aspects of applied surface science but will also include posters presenting ASSD history as well as the “Top 30” poster. All are welcome to attend the Tuesday evening ASSD business meeting, featuring brief capsule presentations by our student award finalists, and a workshop (co-sponsored by the ASTM-E42 Committee on Surface Analysis) that will take the form of the point-counterpoint discussions popular during the division’s history. A special part of our Tuesday business meeting will be devoted to honoring our division founder, Cedric Powell. AS1 Quantitative Surface Analysis: Obtaining Quantitative Information in the Face of Material Complexity and Morphology Influences John Grant, General Dynamics Information Technology, "ASSD 30th Anniversary Speaker: Sensitivity Factors in XPS: Where Do They Come From and How Accurate Are They?" Robert Opila, University of Delaware, "Photoemission from Complex Material Systems: Obtaining Quantitative Information" AS2 Practical Surface Analysis I: Multiple-technique Problem-solving and Structure-property Correlations Donald Baer, Pacific Northwest National Laboratory, "ASSD 30th Anniversary Speaker: Evolution of the Nature and Application of Surface Analysis: Challenges, Pitfalls, and Opportunities Past, Present and Future" Dario Stacchiola, Brookhaven National Laboratory, "Unraveling the Dynamic Nature of Mixed-metal Oxides Nanocatalysts: An In-situ Multiple-Technique Approach" AS3 Practical Surface Analysis II: Influence of Sample Preparation and Novel Sample Prep Techniques John Fletcher, University of Gothenburg, Sweden, "Intricacies of Sample Preparation for ToF-SIMS Analysis of Biological Specimens" John Moulder, Physical Electronics Inc., "ASSD 30th Anniversary Speaker: 30 Years of Surface Analysis: The Transition from Single Crystals to Complex Nanostructures" AS4 Practical Surface Analysis III: Interpretation Challenges Kateryna Artyushkova, University of New Mexico, "Building the Link Between XPS Data and Functional Properties of Materials" James Castle, University of Surrey, UK, "ASSD 30th Anniversary Speaker: XPS: Three Challenges and an Opportunity" AS5+NS Chemical/Molecular Information from Sub-micron Features and Materials C. Richard Brundle, C R Brundle & Assoc, "ASSD 30th Anniversary Speaker: Detection and Characterization of submicron to nanometer defects in Wafer Processing" Olga Ovchinnikova, Oak Ridge National Laboratory, "Multimodal Imaging for Physical and Chemical Surface Characterization using a Combined Atomic Force Microscopy-Mass Spectrometry Platform" AS6+SS Advances in 2D Chemical Mapping and Data Analysis Julia Fulghum, University of New Mexico, "ASSD 30th Anniversary Speaker: Chemical State Imaging with XPS: Broadening the Application Space" Barry Wise, Eigenvector Research, Inc., "Enhancing Chemical Contrast: Latest Trends in Hyperspectral Image Analysis" AS7+BI Challenges in the Characterization of Polymer/Organic/ Biological Systems Ian Gilmore, National Physical Laboratory, UK, "Going Beyond State of the Art in Chemical Imaging of Organic and Biological Materials" Birgit Hagenhoff, Tascon GmbH, "ASSD 30th Anniversary Speaker: 30 Years (ToF-)SIMS of Organic Materials: from Monolayer to 3D Microarea Analysis" AS8+SS Characterization of Buried Interfaces L.Douglas Bell, Jet Propulsion Laboratory, California Institute of Technology, "Current Topics in Interface Characterization using Ballistic Electron Emission Microscopy and Related Techniques" Fred Stevie, North Carolina State University, "ASSD 30th Anniversary Speaker: Characterization of Sub-surface Interfaces using SIMS, TEM, and FIB, or: How Much will it Cost to fix that Interface?" AS9 Applied Surface Science Poster Session BIOMATERIAL INTERFACES (BI): The Biomaterials Interfaces Division is organizing a series of sessions to provide an interdisciplinary forum for the presentation and discussion of fundamental aspects of bio-interface science and engineering. The need to increase our understanding of the interactions between biomolecules and surfaces, the behavior of complex macromolecular systems at materials interfaces, and interactions between biomolecules, is being driven by the rapid growth in biomedical research and the role these applications play in the fields of biology, biotechnology, diagnostics, dentistry and medicine. The BI program brings together recent advances made in materials science and molecular biology with sophisticated surface and interface analysis methods, and theoretical and modeling approaches to biological systems. Areas of interest are: Cells at Surfaces, including cell-material interactions, biofilms, biofouling, tissue engineering, and artificial organs; Biomolecules at Interfaces, including proteins at surfaces, nucleic acids, polysaccharides, adsorption, blood-contacting materials, bioadhesion, and infection and immunity; Biophysics at Interfaces, including: biological membranes, vesicles, membrane processes, forces, recognition, and signaling; Micrometer and Nanometer-Scale Biological Interfaces, including: patterning, nanofabrication, imaging, microscopy, microfluidics, time- and spatial resolution, scanning probe techniques; Characterisation of Biological and Biomaterials Surfaces, including spectroscopy, imaging, microscopy, optical and mechanical methods of thin film analysis, characterization in fluids, quantification, and chemometrics; Biosensors and Diagnostics, including: microfluidics, point-of-care devices, and electrochemistry; and Synthesis and Processing of biomaterials and biologically inspired materials. The program, which begins with the traditional Sunday afternoon Plenary Session, includes an exciting new feature this year: we invite submissions of Flash Presentations, to be made in a dedicated session with an accompanying Networking Session involving associated poster presentations. Prizes will be awarded for the best Flash Presentations. BI1 Cells at Surfaces Matt Becker, University of Akron, “Using Gradient Technologies to Optimize Materials for Regenerative Medicine” BI2 Biomolecules at Interfaces Sanjay Kumar, University of California, Berkeley, “Cells and Extracellular Matrices as Smart Materials: Dissecting and Rebuilding Mechaniobiological Units” BI3 Biophysics at Interfaces Zev Gartner, University of California, San Francisco, “A Strategy for Tissue Self-organization that is Robust to Cellular Heterogeneity and Plasticity” BI4 Micrometer and Nanometer-Scale Biological Interfaces Noo Li Jeon, Seoul National University, Korea, “Aligned Nanofibrous Membrane for Cell Sheet Manipulation and 3D Tissue Formation” BI5+AS Characterization of Biological and Biomaterials Surfaces David Castner, University of Washington, “Quantifying the Surface Chemistry and Overlayer Thickness of Functionalized Nanoparticles” BI6 Biosensors and Diagnostics Ralf Richter, CIC biomaGUNE & MPI for Intelligent Systems, Spain, “Soft and Hydrated Surface-confined Biomolecular Films. Quantitative Physico-chemical Analysis” BI7+PS Synthesis and Processing David Graves, University of California, Berkeley, “Plasma Biomedicine and Reactive Species” BI8 Biomaterial Interfaces Flash Presentation/Poster Session ELECTRONIC MATERIALS AND PROCESSING (EM): The Electronic Materials and Processing Division (EM) encompasses the science and engineering of materials and interfaces that advance device technology. Researchers from around the world will present their work on dielectrics, semiconductors, and metals for advanced logic and ultra-dense memory devices as well as ultra low power, opto-, and nano-electronics. The themes include: EM1+NS+PS More Moore! Materials and Processes to Extend CMOS Another Decade Robert Clark, TEL Technology Center, America, LLC, "Harnessing Chemistry to deliver Materials and Process for the Next 10 Years of CMOS Evolution" Ji Ung Lee, SUNY College of Nanoscale Science and Engineering, “2D Bipolar Devices for Novel Logic Applications: Fabrication, Characterization and Applications” John Robertson, Cambridge University, UK, “Materials Selection for Oxide-based RRAM” Joshua Robinson, The Pennsylvania State University, “Going Big in Two-Dimensions” Emanuel Tutuc, The University of Texas at Austin, "2D Materials Heterostructures and Device Applications" EM2 Beyond CMOS: Materials and Devices for a Post CMOS Era Sanjay Banerjee, University of Texas at Austin, "Interlayer Tunnel FETs" Seongjun Park, Samsung, "2D Materials and Devices" Dan Ralph, Cornell University, "Spin-Torque Switching with the Giant Spin Hall Effect" Grace Xing, Cornell University, "Secret Ingredients in Thin-TFET: A 2D Material-based Transistor" EM3 More than Moore: Novel Approaches for Increasing Integrated Functionality Bill Bottoms, Third Millennium Test Solutions, "Maintaining the Pace of Progress as we Approach the end of Moore’s Law: Heterogeneous Integration, New Materials, New Processes, New Architectures" Thomas Kazior, Raytheon Company, "More than Moore-Wafer Scale Integration of Dissimilar Materials on a Si Platform" EM4 Interconnects: Methods and Materials for Removing Connectivity Constraints Mikhail Baklanov, IMEC, "Innovative Technological Solutions for Low-k Integration Beyond 10 nm" Jeff Bielefeld, Intel Corp., "Challenges and Directions for Enabling Capacitance Scaling to the 10nm node and Beyond" Hash Pakbaz, SBA Materials, "Properties and Integration Status of k = 2.2 Ultra low-k Liquid Phase Self Assembly Coatings for ILD Application" EM5+AS+SS Oxide Materials and Interfaces with Electronic Applications Sang-Yeol Lee, Cheongju Univ., "Bandgap Engineering and Application of SiZnSnO Amorphous Oxide Semiconductor" Garrett Moddel, Univ. of Colorado at Boulder, "Harvesting Energy with Optical Rectennas: Challenges and Innovations" Darrell Schlom, Cornell University, "Better Tunable Dielectrics through Interface Engineering" EM6 III-N Nitrides for Optoelectronic Applications Stefano Cabrini, Lawrence Berkeley National Laboratory (LBNL), "III-Nitride Nanofabrication of Advanced Nanophotonic Device Structures" Daniel Dapkus, Univ. of Southern California, "InGaN/GaN Nanostructures for Light Emission and Possible White LEDs" Shalini Gupta, Northrop Grumman, "Advanced III-Nitrides Devices for RF Switch Applications" EM7+AS+EN+NS Nanoparticles for Electronics and Photonics Bart Kooi, Univ. of Groningen, The Netherlands, "Tailor-made Gas Phase Based Nanoparticles with Functional Properties" Matt Law, University of California, Irvine, "Elimination of Bias-stress Effect in Quantum Dot Transistors" EM8+EN Materials for Light Management Vivian Ferry, University of Minnesota, "Controlling Light Absorption with Nanophotonics" Anna Fontcuberta i Morral, Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland, "III-V Nanowires for Photonic and Solar Cell Applications" EM9+AS+MS+SS Surface and Interface Challenges in Wide Band Materials Brian Downey, NRL, "Schottky Contacts to N-polar GaN and GaN HEMTs" Patricia Mooney, Simon Fraser Univ., Canada, "Effects of Nitrogen and other Impurities on Near-interface Defects in SiO2/SiC" EM10+AS+EN+SE Thin Films and Materials for Energy Storage Nancy Dudney, Oak Ridge National Laboratory, "Thin Films as Model Materials for Li-ion Battery Studies" Alexander Kozen & Gary Rubloff, University of Maryland, College Park, "Solid State Electrolytes and Batteries as Enablers for Energy Storage Beyond Lithium Ion"" EM11+PS Materials and Processes for Next Generation Lithography Glenn Fredrikson, UC-Santa Barbara, “Forward and Inverse Computational Tools for Directed Self-Assembly” Jim Thackeray, Dow, "Novel Material Solutions for Next Generation Lithography" EM12+PS Moore’s Law Panel Discussion EM13 Electronic Materials and Processing Poster Session MAGNETIC INTERFACES AND NANOSTRUCTURES (MI): The Magnetic Interfaces and Nanostructures Division (MI) program features pioneering, controversial, introductory and emerging results in topical areas related to magnetic interfaces and nanostructures. The 2015 MI program topics include: (1) Interfacial Effects in Oxide Heterostructures; (2) Spin current and dynamics; (3) Unconventional spin textures; and (4) Hybrid magnetic structures. In addition, we plan to have a special session about Magnetics Industry & Moore with invited speakers from industry. The 2015 program highlights electron spin related phenomena at the crossroad of basic and applied science. MI also organizes a panel discussion on current trends and future directions of magnetism research to assist MI in identifying the most pressing topics in its areas of interest. The Magnetic Interfaces and Nanostructures Division will be selecting the best graduate student presentation from finalists for the Leo Falicov Award. MI will also offer an award for postdoctoral fellows who will be presenting papers at this year’s International Symposium. The winner of both awards will be announced towards the end of the meeting. MI1 Interfacial Effects in Oxide Heterostructures Yayoi Takamura, UC-Davis, "Magnetic Interactions at Perovskite Oxide Interfaces" MI2+SA Spin Current and Dynamics Stefano Bonetti, Stockholm University, Sweden, "Time-resolved Imaging of Magnetism at the Nanoscale" Georg Woltersdorf, University of Halle Germany, “Spin Hall Effects in Metallic Multilayers” MI3 Unconventional Spin Textures Geoff Beach, MIT, "Chiral Spin Textures in Ultrathin Ferromagnet" MI4 Hybrid Magnetic Structures Dan Dougherty, North Carolina State University, "Indirect Modification of Magnetic Surface States by Organic Semiconductor Adsorbates" David Lederman, West Virginia University, “Complex Fluorides: A New Class of Multiferroic and Magnetoelectric Materials?” MI5 Magnetics Industry & Moore MI6 Magnetic Interfaces Poster Session MEMS and NEMS (MN): The MEMS and NEMS Technology Group (MN) program will highlight recent advances the broad areas of micro/nanoelectromechanical systems (MEMS/NEMS), especially latest fundamental studies of novel materials, processes, devices, and emerging functions and applications of MEMS/NEMS, in various areas including manufacturing, energy, communication, and healthcare. The ability to manipulate and engineer mechanical structures in various emerging lowdimensional materials raises intriguing possibilities of integrating these devices with existing fluidic, electronic and optical onchip networks. This year’s session will cover these areas which are thematically related to multi-scale phenomena and interactions of materials with focus on advanced lithography, pattern transfer and fabrication at the micro/nanoscale, along with characterization, integration and packaging of MEMS/NEMS. The program continues to embrace latest progresses in optical MEMS/NEMS, micro/nanophotonics, optomechanics, quantum MEMS/NEMS, resonant systems, CMOS-MEMS, mesoscopic dynamics and dissipation processes, inertial sensors, chemical sensors and lab-on-chip analytical microsystems, harshenvironment transducers, parametric and nonlinear MEMS/NEMS, and MEMS/NEMS-enabled energy technologies, etc. It also aims to capture some of the latest advances in soft materials, flexible and implantable MEMS/NEMS for biosensing, bioinspired microsystems, wearable and wireless healthcare. The AVS62 MN program also highlights focus sessions to feature latest advances and exciting new results in scalable and additive nanomanufacturing, and fundamental nanomechanics and NEMS based on atomically thin 2D crystals. MN1+MG Multiscale Phenomena & Interactions in Micro- and Nano-Systems Beth Pruitt, Stanford University, “Microengineering for Mechanobiology” MN2 Optical MEMS/NEMS, Photonics, and Quantum Nanosystems Ania Bleszynski Jayich, University of California, Santa Barbara, "Mechanics and Spins in Diamond" MN3+BI BioMEMS/NEMS, Wearable and Implantable Devices Mehran Mehregany, Case Western Reserve University, “MEMS Sensors make up the Frontline of Wireless Health Solutions” Kurt Petersen, KP MEMS, “Entrepreneurial Environment for Implantable and Wearable BioMEMS” MN4+AM Emerging Materials & Fabrication Technologies toward Scalable & Additive Nanomanufacturing Stephen Chou, Princeton University, “Large-Area Nanoimprinting and Nanoplasmonics for Energy Harvesting, LEDs & Biosensing” Khershed P. Cooper, National Science Foundation Costas Grigoropoulos, University of California, Berkeley, "Scalable Laser-Assisted Three Dimensional Printing of Nanomaterials" Jay Guo, University of Michigan, Ann Arbor, “Roll to Roll Processes at the University of Michigan: Continuous Patterning, Flexible OPVs, and Growth of Carbon Nanomaterials” Tsu-Jae King Liu, University of California, Berkeley, "Material Requirements and Challenges for NEM Logic Relays" Regina Ragan, University of California, Irvine, "Scalable Nanomanufacturing of Metasurfaces" Axel Scherer, California Institute of Technology, "Scalable Fabrication of 3D Nanostructures and Implantable Devices" Christian Zorman, Case Western Reserve University, “Microplasma-based Direct-write Patterning Processes for Additive Microfabrication” MN5 Atomic Layer Nanostructures and 2D NEMS Evan Reed, Stanford University, "Emergent Piezoelectricity and Phase Changes in 2D Materials" Tian-Ling Ren, Tsinghua University, China, "Graphene Thermoacoustic Devices and Applications" MN6 MEMS and NEMS Poster Session MANUFACTURING SCIENCE AND TECHNOLOGY (MS): MSTG is focusing on two manufacturing areas in 2015. First, we will tackle the manufacturing challenges of power electronics. The challenges of manufacturing high energy density, high temperature capacitors, low loss, high frequency magnetic materials, and wide bandgap switches will be covered. Second, MSTG will build on the Industrial Physics Forum’s invited sessions in Mesoscale Science and Technology and Metamaterials with our sessions in the area of functional mesoscale assemblies. We encourage submissions in materials processing, characterization, metrology, and processing equipment needed to address the challenge of manufacturing devices and structures on inexpensive, green scaffolds for applications in electronics, energy, biotechnology, sensing and security. MS1+PS+EM+TF Manufacturing Challenges in Power Electronics Including Wide Band Gap Materials John Muth, North Carolina State University, "Accelerating Adoption of Wide Band Gap Semiconductors Through Manufacturing Innovation" MS2+TF Functional Mesoscale Assemblies: From Textiles to Smart Sensors Sundaresan Jayaraman, Georgia Institute of Technology, "On Smart Textiles and Vacuum: The Joys of Discovery and Innovation on Quality of Life" MS3+TF Functional Mesoscale Assemblies: Green Materials Doing New Things MS4 Aspects of Manufacturing Science and Technology Poster Session NANOMETER-SCALE SCIENCE AND TECHNOLOGY (NS): This division (NS) explores the science and technology that emerges when material is shrunk to the nanoscale. Researchers from around the globe will present their work on topics ranging from fabricating atomically precise devices to exploiting nanomaterials for applications in nanophotonics, catalysis, and flexible devices. We will explore both methods for synthesizing nanostructures and the tools for understanding nanoscale phenomena. We have invited leading figures to provide perspective from the forefront of their respective fields and to highlight the sessions listed below. For this year, we have also added two new sessions focused on the emerging area of nanodiamond synthesis, processing, and application. NS1 Delivering Energy and Mass at the Nanoscale Keith A. Brown, Northwestern University, “2014 NSTD Post Doc Award Winner Talk: Directing Nanoscale Mass and Energy Transport using Cantilever-Free Scanning Probes” Meyya Meyyappan, NASA Ames Research Center, “Nanomaterials in Sensor and Electronics Development” NS2+SS+EN Nanophotonics, Plasmonics, and Energy Jennifer Dionne, Stanford University, “Efficient Solar Upconversion with Plasmonic Hot Carriers” NS3+PS Nanopatterning and Nanolithography J. Alexander Liddle, NIST, “Nanomanufacturing: from Silicon to DNA” NS4+SS+TF+MG+EN Nanoscale Catalysis and Surface Chemistry Milko Van der Boom, The Weizmann Institute of Science, Israel, “Pyridine Coordination Chemistry for Molecular Assemblies” NS5+SP Nanoscale Imaging and Materials Characterization Ozgur Sahin, Columbia University, “Chemically-specific Intramolecular Imaging with Atomic Force Microscopy” NS6+MN Nanoscale Mechanics Michael Roukes, California Institute of Technology Kimberly Turner, University of California, Santa Barbara, “Visualizing Catalytic Reactions and Light-matter Interactions with Nanometer-scale Resolution” NS7+AS+SP Optical Spectroscopy at the Nanoscale Dmitri Basov, University of California San Diego, “Nano-photonic Phenomena in van der Waals Heterostructures” Mikhail Belkin, University of Texas at Austin, “Tip-enhanced Infrared Photoexpansion Nanospectroscopy in Air and Aqueous Solutions” Simone Ruggeri, EPFL, Switzerland, “Infrared Nanospectroscopy Characterization of Oligomeric and Fibrillar Aggregates during Amyloid Formation” NS8 Focused Ion Beams Chad Rue, FEI Co, “Nanofabrication Using Gas-Assisted Focused Ion Beams” NS9 Nanodiamond for Nanomedicine Lloyd Hollenberg, University of Melbourne, “Quantum Sensing in Biology using the Nitrogen-Vacancy Centre in Diamond” NS10 Quantum Properties of Color Centers in Nanodiamonds and Related Applications Joerg Wrachtrup, University of Stuttgart, “Quantum Sensors for Practical Applications” NS11 Nanometer-scale Science and Technology Poster Session PLASMA SCIENCE AND TECHNOLOGY (PS): The PS program highlights state-of-the-art advances in plasma research, ranging from fundamental studies of plasma physics and chemistry to new applications in plasma processing. Abstracts describing novel research are being solicited in the areas of plasma etching and deposition, plasma modeling, plasma surface interactions, plasma sources and plasma diagnostics, sensors and control. Other areas of interest are atomic layer deposition (ALD)/ atomic layer etching (ALE), atmospheric pressure plasmas and their applications (i.e., discharges in liquids or multiphase media), advanced ion implantation and plasma doping, plasma synthesis of novel materials, plasma processing for 2D materials (such as graphene), plasmas for medical and biological applications (i.e.: plasma medicine) and plasmas in green technologies. In addition to the oral sessions, abstracts may be submitted to the poster session, which provides an excellent opportunity for one-on-one discussion of new results with colleagues. PS1 Advanced FEOL/Gate Etching Sebastien Barnola, CEA, LETI, MINATEC Campus, France, “FEOL Challenges for Advanced FDSOI Technology” Miyako Matsui, Hitachi, Japan, “Analysis of Surface Reaction Layers formed by Highly Selective Etching with Pulsed Microwave Plasma” PS2 Advanced BEOL/Interconnect Etching John Arnold, IBM Albany Nanotech Center, “Interconnect Patterning in the EUV Era” Harmeet Singh, Lam Research Corporation, “Solving Critical Challenges in Contact and Interconnect Etches for 10 nm and Below” PS3+AS+SS Plasma Surface Interactions Vincent Donnelly, University of Houston, "Plasma-surface Interactions at Low and High Pressures" Kouichi Ono, Kyoto University, Japan, "Plasma-induced Surface Roughening and Ripple Formation during Plasma Etching of Silicon" PS4 Plasma Diagnostics, Sensors and Control Mike Ashfold, Univ. of Bristol, UK, "Probing the Plasma Chemistry that Underpins Diamond Chemical Vapour Deposition" Frank De Lucia, Ohio State University, "Submillimeter Studies of Molecular Plasmas: Applications to Semiconductor Plasma Processing" PS5 Plasma Modeling Yeon Ho Im, Chonbuk National University, Republic of Korea, “Realistic Plasma Etch Simulation for High Aspect Ratio Contact Hole using Graphics Processing Unit” Phillip Stout, Applied Materials, “Feature Scale Modeling of Semiconductor Processes” PS6 Plasma Sources Jes Asmussen, Michigan State University, “Microwave Plasma Source Technologies: a Fifty Year Evolution from Unwanted Discharges, to Free Radical Sources, to Low Pressure and Temperature Plasma Processing, to the Synthesis of Gem and Electronic Material Quality Diamond” Neil Benjamin, LAM Research, “Around the World of RF-Plasma Generation (in 80 Demi-minutes)” PS7+TF Plasma Deposition and Plasma Assisted ALD Peter Awakowicz, Ruhr-University Bochum, Germany, “Plasma Deposited Barrier Coatings on Plastics: Plasma Characterization and Thin Film Analysis” PS8+SS+TF Atomic Layer Etching (ALE) and Low-Damage Processes Olivier Joubert, LTM - CEA/LETI, France, “Atomic Precision Etching in ICP Plasmas” Alok Ranjan, TEL Technology Center, America, LLC, “Atomic Layer Etching to Escape Process Tradeoffs for 7nm Technology and Beyond” PS9+SE Advanced Ion Implantation and Plasma Doping Anthony Renau, Applied Materials, “Evolutionary Trends in Ion Implantation” Hirokazu Ueda, Tokyo Electron Limited, Japan, “Conformal Arsenic Doping using a Radial Line Slot Antenna Microwave Plasma Source” PS10+AP Atmospheric Pressure Plasma Processing; Fundamental and Applications Peter Bruggeman, University of Minnesota, “Non-Equilibrium Plasmas in Contact with Solutions: Biological Interactions and Material Synthesis” Leanne Pitchford, University of Toulouse, "Modeling Non-Equilibrium Plasma Jets at Atmospheric Pressure" PS11 Plasma Synthesis of Novel Materials Mike Gordon, UC Santa Barbara, “Microplasma Based Synthesis of Nanomaterials” Makoto Sekine, Nagoya University, Japan, “Low-Damage Etching Technology for Nitride Semiconductor Devices” PS12+2D Plasma Processing for 2D Materials Li-Chyong Chen, National Taiwan University, Taiwan, Republic of China, “Plasma Processes of Graphene and Related 2d Materials for Energy Applications” Daniil Marinov, LPP-CNRS, Ecole Polytechnique, France, “Cleaning and Doping of CVD Graphene using Tailored Voltage Waveform Capacitively Coupled Plasma” PS13+SM Plasmas for Medicine and Biological Applications Jean-Michel Pouvesle, GREMI CNRS/Université d'Orléans, France, “Potential of Low Temperature Plasma Sources in Cancer Treatment” Steven Shannon, North Carolina State University, “Towards High Volume Processing of Liquids using a Scalable RF Source with a Powered Liquid Electrode” PS14 Plasmas in Green Technology Richard van de Sanden, DIFFER, Netherlands, “Plasma Prize Talk: Plasma Processing of Materials: What makes Plasma Special and Future Outlook?” PS15 Plasma Science and Technology Poster Session SURFACE SCIENCE (SS): SS provides a forum for cutting-edge research that involves solid surfaces and interfaces. Phenomena that take place at the gassolid and liquid-solid interfaces are prominent within the Division programs. Technical sessions address atomistic, structural, electronic and chemical phenomena at surfaces and interfaces, their impact on materials properties, and their implication for technology and environmental processes. Surface Chemistry is an important divisional theme, encompassing the kinetics and dynamics of surface chemical events from adsorption and reaction to catalysis. Film and nanostructure growth is another key theme, explored from a fundamental perspective, through the development of new growth and processing methods for materials preparation. Surface chemical modification and photon-driven chemistry at surfaces are important concentrations. Lively sessions are devoted to the surface science of metallic, semiconductor, oxide and organic surfaces that support unique chemical activity and electronic properties. Surface science applications in high-impact areas - particularly energy science, microelectronics, nanotechnology, and environmental science - are highlighted in the program. This Division's overarching goal is to provide the atomistic insights on solid surfaces and interfaces needed to advance our understanding of materials systems and benefit society. SS1+AS+EN Mechanistic Insight of Surface Reactions: Catalysis, ALD, etc. Hajo Freund, Fritz Haber Institute of the Max Planck Society, Germany, "AVS 2014 Gaede-Langmuir Invited Talk: Models for Heterogeneous Catalysts: Complex Materials at the Atomic Level" Martin Sterrer, Fritz-Haber-Institut der Max-Planck-Berlin, Germany, “Metal Nanoparticles on Thin Film Oxide Supports: Interaction and Reaction of Metals with Hydroxyls” SS2+AS+EN Metals, Alloys & Oxides: Reactivity and Catalysis Donna Chen, University of South Carolina, “Understanding Chemical Activity in Pt-Re Bimetallic Systems” SS3+AS+EN Synthesis, Structure and Characterization of Oxides Matthias Batzill, University of South Florida, “Bulk and Surface Properties of Pure and Mixed Titania” SS4 Environmental Interfaces, Ambient Surfaces and In-Operando Studies Hendrik Bluhm, Lawrence Berkeley National Laboratory, “Investigation of Liquid/Solid Interfaces using Photoelectron Spectroscopy” SS5+AS Atomistic Modeling of Surface Phenomena Bill Schneider, University of Notre Dame, “Ideas Old and New Applied to Non-Ideal Surface Adsorption and Reaction” SS6+NS+AS Nanostructures: Growth Reactivity & Catalysis Steven Tait, Indiana University, “Redox-Active On-Surface Assembly of Metal-Organic Chains with Single-Site Transition Metal” SS7+AS Surface Dynamics, Non-Adiabaticity, and Single Molecule Phenomena Marisol Alcantara Ortigoza, University of Central Florida, “Strategic Applications of the Vibrational Dynamics of the Outer Layer of Metal Nanoparticles and Chemisorbed Surfaces” SS8+EM+AS+EN Semiconductor Surfaces and Interfaces Stacey Bent, Stanford University, “Molecular Functionalization of Semiconductor Surfaces: From Single Crystals to Quantum Dots” SS9+EN Photocatalysis and Photochemistry at Surfaces Hrvoje Petek, University of Pittsburgh, “Ultrafast Time-resolved Photoelectron Spectroscopy of Photocatalytic Surfaces” SS10 Chirality & Enantioselectivity on Surfaces Georg Held, University of Readington, United Kingdom of Great Britain and Northern Ireland, “Racemization and Enantioselectivity on Metal Surfaces” SS11+TF+AS Organics and Ionic Liquids: Surfaces, Layers and Interfaces Hans-Peter Steinrück, Freidrich-Alexander Universitat Erlangen-Nuremberg, Germany, “Interfaces of Ionic Liquids” SS12+NS+AS+EN Nanoplasmonics and Surface Reactions Sulio Linic, University of Michigan, “Chemical Reaction on Photo-excited Plasmonic Nanostructures” SS13 Surface Science Poster Session THIN FILM (TF): The Thin Film Division offers more than 18 core oral sessions and one poster session. A broad range of outstanding invited speakers will touch on topics across the gamut of thin film science and technology. There are several sessions on atomic layer deposition (ALD), encompassing emerging applications, energy, nanoelectronics, thermoelectrics, 1- and 2D-applications, various manufacturing processes, precursor synthesis and properties, and growth characterization. These sessions highlight basic science and the pursuit of applications. We are also excited about the core sessions on Thin Films: growth and characterization, self assembled and layer-by-layer growth. We have a session on Energetic thin films which covers thin films structures with stored chemical energy. We offer new sessions on Biological thin films, Magnetic thin films, Synchrotron radiation, Optical and other characterization of thin films. Various other sessions cover electronic applications and manufacturing processes. We are excited to offer students the possibility to present a 2-3 minute oral synopsis and introduction of their posters at the end of the oral sessions. For the third year, we will host a student-only session to highlight the Harper Award candidates in which the student finalists will present their work in an interactive “Shark Tank” type of Forum. This is an excellent opportunity for graduate and undergraduate students in the Thin Film area to get together informally for discussions and to provide feedback for the Harper Award presentations of their fellow students. The TF Division is proud to present many distinguished invited speakers from cutting edge research. ALD features Virginia Wheeler from the Naval Research Laboratory to present on Integrating Ultrathin ALD/ALE films with 2D Materials to Enable New Device Structures. The Magnetic Thin Films will be discussed by Dieter Weller of Hitachi Global Storage Technologies. Jeffery Terry of the Illinois Institute of Technology will present on Synchrotron Radiation Characterization of Thin films. Adrienne Stiff-Roberts will present on Organic and Hybrid Organic-Inorganic Thin Film Deposition by Resonant Infrared, Matrix-Assisted Pulsed Laser Evaporation. The TF Division will cooperate with the Focus Topic on Accelerating Materials Discovery for Global Competitiveness. There will also be an active interaction with the local Northern California AVS Chapter. TF1+EN ALD for Energy Angel Yanguas-Gil, Argonne National Lab, "From Atom to Solid: The Structure of Amorphous ALD Thin Films and Nanolaminates" TF2+SS ALD Surface Reactions and Precursors Anu Mallikarjunan, Air Products, “Applied Materials,"High Performance Precursors for Atomic Layer Deposition of Silicon Containing Films" TF3+MS Atmospheric, Spatial, Roll-to-Roll and Other Manufacturing Advances in ALD Sang Lee, Veeco, "Nano-composite Layer for a Flexible Encapsulation with the FAST-ALD Process" TF4 ALD for Emerging Applications Yongfeng Mei, Fudan University, China, "Self-Rolling of Thin Solid Films for 3D Devices" TF5+NS+EM ALD for Nanoelectronics and Nanopatterning Dennis Hausman, Lam Research Corporation, "Atomic Layer Deposition of Silicon Dielectrics for Semiconductor Applications" Veena Misra, NCSU, "ALD Dielectrics for Power Electronics" TF6+EM+MI ALD for Piezo, Capacitive, Thermoelectric and Other Alternative Devices Ramakrishnan Rajagopalan, Penn State, "ALD for Capacitor Technology" TF7+MG CVD, ALD, MLD, and PLD of Hybrid Materials Adrienne Stiff-Roberts, Duke University, "Organic and Hybrid Organic-Inorganic Thin Film Deposition by Resonant Infrared, Matrix-Assisted Pulsed Laser Evaporation" TF8+NS+2D+MG ALD on 1D and 2D materials Virginia Wheeler, Naval Research Laboratory, "Integrating Ultrathin ALD/ALE Films with 2D Materials to Enable New Device Structures" TF9+PS+SM Plasma-Enhanced ALD Harm Knoops, Oxford Instruments, "Status and Prospects of Plasma-Assisted Atomic Layer Deposition" TF10+MN Advanced PVD and PECVD and Chemical Vapor Infiltration Methods into High Aspect Ratio Structures Robert Davis, Brigham Young University, "Fabrication of Vertical Microstructures in Metal, Ceramic, and Polymer by Chemical Vapor Infiltration of Patterned Nanotube Forests" Murali Narasimhan, Applied Materials Advanced Products, "The Many Avatars of PVD" TF11+SS+AS Self-Assembled Monolayers, Layer-by-Layer, etc. Cathleen Crudden, Queen’s University, Canada, “N-heterocyclic Carbenes as Ligands in the Formation of Highly Ordered Self-assembled Monolayers on Gold” TF12+EM+AS+EN Energetic and Thermal Properties of Thin Films Troy Barbee, Lawrence Livermore National Laboratory, "Multilayers and Nano-Laminates: Science and Technological Applications of these Nano Materials" TF13+NS+AS+SA Thin Film: Growth and Characterization, Optical and Synchrotron Characterization Angélique Bousquet, Institut de Chimie de Clermont, France, "Oxynitride Thin Films by Reactive Radiofrequence Magnetron Sputtering - Versatile Materials for Optical Applications" Jeffery Terry, Illinois Institute of Technology, "Surface Science in The Wild: Using Synchrotron Radiation and Lab Grown Thin Films to Understand The Behavior Of SiC in Accident Tolerant Nuclear Fuels" TF14+BI+AS Thin Films for Biological and Biomedical Applications Mallika Kamarajugadda, Medtronic, "Thin Film Technologies for Biomedical devices-Current State of Art and Future Opportunities" François Rossi, NanoBiotechnology Laboratory at JRC Ispra, "Influence of the Biological Interface of Nanoparticles on the Interaction with Cellular Systems" TF15+PS Thin Film for Permeation Barriers and Membranes Stuart Cogan, UT-Dallas, “Thin-film Dielectrics for Chronic Nonhermetic Encapsulation of Electrically Active Neural Implants” Hindrik de Vries, DIFFER, The Netherlands, "High Current Dielectric Barrier Discharge Processing Towards Roll-to-Roll Thin Film Deposition" TF16 Thin Film and Nanostructured Coatings for Light Trapping and Plasmonic Applications Joseph Herzog, University of Arkansas, "Plasmonic Properties of Nanostructures with Sub-lithography-limited Features" TF17+MI Magnetic Thin Films Dieter Weller, HGST, "FePt nanoparticles for Heat Assisted Magnetic Recording: Top and Bottom Interfaces, Intergranular Segregants and Roughness Optimization" TF18 Northern California AVS Chapter TF19 Thin Films Poster Session VACUUM TECHNOLOGY (VT): The Vacuum Technology Division (VT) encompasses the science of achieving, maintaining, analyzing, and measuring vacuum across many applications. We seek contributions in both our core sessions of Vacuum Measurement and primary standards, Gas Dynamics and Modeling, Pumping Systems, Accelerator and Large Vacuum Systems, Partial pressure analysis and Vacuum Quality Analysis, Outgassing and Control. We additionally are soliciting abstracts in the special sessions on gas and process analysis for industrial applications, motion, movement, load locks and vacuum suitcases, history of vacuum technology, and particulate issues in high and ultra-high vacuum. Additionally, we are pleased to announce the second annual VT Early Career Award, with nominations for outstanding research by young scientist or engineer in the fields of vacuum science and technology, and encourage applications through the AVS awards website. We would also like to highlight the VT Poster session, featuring Student Poster Competition with a $500 first place award where students in any discipline are invited to share their innovative solutions to vacuum equipment challenges. Student presenter awards will also be given for the best presentations by students in the VT sessions. VTD will again host the "Ask the Experts" booth, located in the exhibit area, where experienced vacuum scientists, engineers and technicians strive to answer perplexing vacuum technology issues. VT1 Vacuum Measurement, Calibration, and Primary Standards VT2 Gas Dynamics and Modeling VT3 Pumping Systems Sergei Syssoev, Brooks Automation, "The Evolution of Cryopumps" VT4 Accelerator and Large Vacuum Systems Eshraq Al Dmour, Max IV, "MAXIV Vacuum System: From Design to Operation" VT5 Partial Pressure Analysis Jonathan Leslie, MKS Instruments, Inc., "Double Deflection and Enhanced Detection - The Use of a Novel Ion Optics for Metastable Rejection and Improved Detection in the Low ppb Range" VT6 Gas and Process Analysis for Industrial Applications Matt Kowitt, Stanford Research Systems, "The Deployment of a Commercial RGA to the International Space Station" VT7 Motion, Movement and Load Lock Challenges in Vacuum VT8 History of Vacuum Technology Paul Arnold, MKS Instruments, Inc., Granville-Phillips Product Center, "History of Widely-used Vacuum Gauges and the Variations and Motivations that Occurred Along the Way: How Did We Get Where We Are?" VT9 Methodology for Improving Vacuum Performance Jed Bothell, Atlas Technologies, "Current Advances in Materials and Methods for UHV and XHV Environments" Austin Henry, Atlas Technologies, "Current Advances in Materials and Methods for UHV and XHV Environments" Ron Vane, XEI Scientific Inc., "Plasma Cleaning of SEMs and Large Vacuum Systems" VT10 Vacuum Suitcase for Transporting Critical Components Daniel Babbs, Brooks Automation, "Mobile Vacuum Environments and Their Applications for Semiconductor Manufacturing" Paolo Michelato, Italian National Institute for Nuclear Physics (INFN), "Experience of UHV Transportation of Critical Components" VT11 Particulate Issues in High Vacuum and Ultrahigh Vacuum David Pui, University of Minnesota, "Particle Behavior in Vacuum Systems: Protection Schemes for EUVL Critical Surfaces, Speed Controlled Particle Injection, Prevention of Particle Formation during Pump Down" VT12 Vacuum Technology Student Poster Session SPECIAL SESSIONS & EVENTS BIOMATERIALS PLENARY SESSION (BP): The Biomaterial Interfaces Division program will commence on Sunday afternoon with the Biomaterials Plenary (BP). This year we are pleased to have presentations from three eminent scientists and engineers who have made important contributions to our field. Jacob Israelachvili has made seminal contributions to our understanding of intermolecular and surface forces in complex fluids, biological and materials systems. Philip Messersmith has made important contributions in a broad swathe of biomaterials science, encompassing adhesion, functional coatings, regenerative medicine, drug delivery and nanomedicine. Suzie Pun develops bioinspired materials to advance drug delivery and molecular imaging technologies, in areas including cancer therapy, the central nervous system and cell therapy. She strives to achieve this goal by integrating techniques from engineering, chemistry, and cell biology. The session will close with the opportunity for further discussions at our traditional industry sponsored Plenary Reception. BP1 Biomaterials Plenary Session Jacob Israelachvili, University of California, Santa Barbara, “Experimental and Theoretical Challenges regarding the Fundamental Interactions between Biomolecules and Biosurfaces” Philip Messersmith, University of California, Berkeley, “Biomimetic Surface Coatings Inspired by Polyphenols Found in Mussels, Tea, Wine and Chocolate” Suzie Pun, University of Washington, “Targeted Biomaterials: Applications in Hemostasis, Immunomodulation and Gene Delivery” EXHIBITOR TECHNOLOGY SPOTLIGHT (EW): Abstracts are solicited from Exhibitors only for presentations to all symposium attendees during technical session breaks. Papers submitted and material presented during the presentation must provide technical information and/or analysis using a specific exhibitor product, technique or service. The Exhibitor Technology Spotlight will emphasize: New instrumentation, products, services, techniques and/or new applications in research, industrial, manufacturing or processing; Technology transfer from R&D to manufacturing; Scale-up aspects and innovations in manufacturing practices; Technology/economic aspects and market impact of new and innovative scientific and/or engineering technologies. The 20 minute presentations will be held in stage area of the exhibit hall and will take place during symposium session breaks to ensure maximum attendance. Cost is $500 ($400 for Corporate Members). For space availability, contact Jeannette DeGennaro (Jeannette@avs.org). EW1 Exhibitor Technology Spotlight Session AVS LATE BREAKING SESSION: There will be opportunities for presentation of post-deadline discoveries in all fields relevant to the AVS membership. Submissions that address topics in surfaces, interfaces, films, nanometer-scale phenomena, emerging technologies, or new innovations. Abstracts will be solicited starting in mid-July for either (1) an individual 20 minute oral presentation, or (2) a poster presentation. Late Breaking Abstracts will be used to fill holes in the program and they must be submitted via the AVS website by Friday, August 21, 2015. Notification of acceptance/rejection will be made soon thereafter. Please check the AVS 62 (www.avs.org) website for details and submission guidelines in July. AVS VENDOR EXHIBIT: The Exhibit comprises an extensive display of tools, equipment and services for film deposition, surface and interface measurements and analysis, materials, chemicals, supplies, vacuum production and measurement, and related instrumentation for surface, interface and film measurements, as well as professional literature and publications. Each year, the technical symposium expands into new and exciting technical disciplines which bring new exhibitors showing new technology and research methods. Our Nanotechnology division has grown to record levels and our focus in emerging technologies, such as fuel cell and energy research, consistently keeps our Symposium fresh and exciting for exhibitors and attendees alike. The exhibits will be open from Tuesday morning until Thursday afternoon (October 20-22). Please contact exhibits@avs.org for additional information. You may also review our website www.avs.org, or contact us at 212-248-0200, ext. 229. All Symposium attendees should make time to visit the Exhibit Hall. AVS SHORT COURSES & TUTORIALS: Short courses and tutorials that offer specialized training in specific areas of vacuum science and related technologies will be offered all week, commencing on Sunday, October 18, 2015. Registration and additional details will be posted on the AVS website in early July. AVS SPONSORSHIP PROGRAM: AVS is a not-for-profit society that offers a myriad of services, programs and events related to science and technology in the fields of vacuum, materials, interfaces and processing to scientists and engineers from around the world. An extensive recognition and exposure program, which is active before and during the Symposium, is available to our Symposium Sponsors. As a Symposium Sponsor, your logo will appear on the AVS website, in the Technical/Exhibitor Program, on signage and slide shows at the Symposium. The earlier you commit to AVS Symposium Sponsorship, the greater exposure you will receive. To learn more about Sponsorship opportunities, please contact Jeannette DeGennaro at 212-248-0200 ext. 229 or jeannette@avs.org or Yvonne Towse at 212-248-0200 ext. 222 or yvonne@avs.org. AVS AWARDS & TRAVEL GRANTS All award applications for AVS National and Division/Group awards may be found at the following link: (http://www.avs.org/Awards-Recognition) Please contact Angela Klink, Member Services Administrator, (angela@avs.org, 212-248-0200 ext. 221) for any additional information. AVS Professional Awards AVS Professional Research Awards: Each year, the AVS solicits nominations for major national awards. These include the Medard W. Welch Award, the Gaede-Langmuir Award, the John A. Thornton Memorial Award and Lecture, the Peter Mark Award, Fellow of the Society and the George T. Hanyo Award. Nominations are due March 31, 2015 and should be submitted electronically to Angela Klink (angela@avs.org). Nomination information is available on www.avs.org or through Angela Klink (212-248-0200, ext. 221 or angela@avs.org) National Student Awards Students may apply for one National Student Award and one Division/Group Award in a given year. Each year, the AVS solicits nominations for eight graduate student awards. These are the Russell and Sigurd Varian Award,, the Nellie Yeoh Whetten Award, the Dorothy M. and Earl S. Hoffman Award, two Dorothy M. and Earl S. Hoffman Scholarships (N.B. the Hoffman Award and Scholarships are distinct from the Hoffman Travel Grants described below) and three Graduate Research Awards. The Application Form and the Report on Candidate Form, along with the nomination procedure, is available on www.avs.org or through Angela Klink (212-248-0200, ext. 221 or angela@avs.org). The deadline is May 4, 2015. Dorothy M. and Earl S. Hoffman Travel Grants The Hoffman Travel Grants have been created in an effort to promote student involvement in AVS and encourage their participation in the annual AVS International Symposium. These travel grants will be given to any applying graduate students who meet the following criteria: 1) you must be an author or co-author of an abstract accepted for presentation at the Symposium, 2) you must be a full-time graduate student, 3) the grant is not transferable, 4) you must attend the Symposium to receive the grant and, 5) only one student per abstract will be given a Hoffman grant. It is not required that the student be the presenter and local students will be eligible for a smaller stipend. An invitation e-mail will be sent to eligible students (late June 2015) and the student should apply for the grant by return e-mail to the AVS National Office. The application deadline is Friday, August 14, 2015. Should your application be approved, you will receive an e-mail notification by Friday, September 18, 2015. Grants will be given on a random basis until the 2015 funds are depleted. Funds for the grant recipients will be available at the Symposium Registration Manager's desk, and you will also be asked to present a student I.D. Please note that all travel grants must be collected at the meeting. Please be advised that receiving a Hoffman Travel Grant does not affect your eligibility for any national, divisional, or technical group merit-based awards. Division/Group Student Awards Students may apply for one National Student Award and one Division/Group Award in a given year. The Applied Surface Science Division is offering student awards. Students who would like to compete for the awards need to submit an abstract for a poster or talk to be presented during any of the ASSD sessions. Presentation during an ASSD sponsored session is required for eligibility. If the ASSD has more than three applicants for the student award, the ASSD Student Award Committee Chair may ask the student candidates to submit an extended abstract, which will be used to down select the number of finalists to three. The three award finalists will present a “capsule” (3-slide, 5-minute) presentation to the judges during the Tuesday night ASSD Business Meeting. The winner will be selected based upon presentation skills, scientific merit and originality of their work. The awards consist of three cash prizes totaling up to $1,000. The student that wins the best presentation award will be reimbursed for meeting registration at the student rate for the following year's AVS meeting and ASSD will ask the award winner to give a talk in a session co-sponsored by ASSD. Students wishing to participate in the competition should complete the application and submit an abstract by May 4, 2015 to Angela Klink (angela@avs.org). The Biomaterial Interfaces Division is offering student awards (starting at $500 for first place) for the best Flash Presentation/Poster or oral presentation at one of the BI sessions on their thesis research. The students will be judged on the scientific merit and originality of their research. Individuals more than one year past the date when their final degree was awarded are not eligible to compete for the student prize. Students may in addition compete simultaneously for one societal level and one Division or Group level award that is presented at the International Symposium. In addition to following the standard AVS abstract submission procedures, the students must submit a copy of their abstract along with a statement of intent to compete for the student prize by May 4, 2015 to Angela Klink (angela@avs.org). In addition please submit this application. Magnetic Interfaces & Nanostructures Division: Leo M. Falicov Student Award has been established in memory of Professor Leo M. Falicov to recognize outstanding research performed by a graduate student in areas of interest to the MIND. Finalists will be selected on the basis of abstract submission, and will receive a cash award upon attending the AVS International Symposium and presenting their paper in an oral session. The Best Student Paper Award winner will be selected on the basis of the oral presentation, considering quality of research and clarity of presentation. The winner will receive of a cash prize and a certificate. Interested applicants should submit an abstract and the application to Angela Klink angela@avs.org. In addition, a copy of the AVS abstract, reprints/preprints of the work, and a letter of recommendation from the advisor should be sent before May 4, 2015. Manufacturing Science and Technology Group is pleased to announce and solicit applications to be competitively awarded to up to 2 graduate students who present papers in MSTG sponsored sessions.. The purpose of the MSTG award is to both encourage participation of students in the MSTG program and to acknowledge the valuable contributions they make in advancing state-of-the-art in manufacturing science and technology. Full-time university graduate students with primary appointments at universities are eligible to apply. Preference will be given to those who give oral presentations of their papers. Students awarded the MSTG Award will receive a grant. Submission materials consist of: 1) Letter of application describing the student‘s research (1 pg. max.); 2) Letter of endorsement by the student‘s research advisor (1 pg. max.); 3) Copy of submitted abstract; 4) Send completed application materials to arrive by the deadline of May 4, 2015 to Angela Klink (angela@avs.org). MEMS and NEMS Technical Group is pleased to announce a “Best Paper Award” competition at the AVS Symposium and Exhibition. The award includes a cash prize ($500) and a certificate to the well deserving student presenting his/her paper in an oral or poster session of the MN group. Both graduate and undergraduate students are eligible. The candidates will be judged on the quality, originality of his/her research and their skill in presentation (oral/poster). In addition, MN group is supporting a Registration Waiver Award to the well deserving graduate/undergraduate student submitting an abstract to the MN session. This award will be solely based on the quality of work mentioned in the abstract. In order to qualify for the competition, interested candidates should submit a cover letter describing their intent to compete for any one of the above mentioned awards along with a copy of their AVS abstract, current CV and application to Angela Klink (angela@avs.org). All application material must be received on or before May 4, 2015. The Surface Science Division solicits nominations for the Morton M. Traum Surface Science Student Award to be given to the best student presenter at the AVS International Symposium. This is the oldest student award in AVS, presented since 1981. A candidate for the award must be registered to give an oral or poster presentation at the AVS International Symposium and be either a current graduate student or have received the Ph.D. degree in the year of the Symposium. Up to a maximum of five finalists will be selected to compete with posters during the Surface Science poster session; these poster presentations are in addition to any different presentation they are registered for at the International Symposium.. The main selection criteria include both scientific content and presentation skill. The winner will receive a cash prize of $1000 and a certificate. The winner's name will appear in the list of previous winners published yearly in the Symposium technical program and on the plaque that is on display at the Symposium. The other finalists will receive a cash award. Traum award applicants should submit 1) a copy of the abstract submitted to AVS that includes the abstract submission number; 2) an extended abstract that does not exceed two pages (including tables, figures, and references); 3) their expected graduation date and 4) an AVS application form for student awards. Electronic submission of all information in a single PDF file, labeled by the applicant's name, (“FirstName_LastName.pdf”) is preferred and should be sent to Angela Klink (angela@avs.org). Deadline: May 5, 2015. The Nanometer-Scale Science and Technology Division Graduate Award brings recognition to outstanding research by graduate students giving oral presentations in NSTD sessions at AVS international symposia. Applications can be submitted by: 1) checking off the appropriate box on the interactive Application Form, or 2) sending a cover letter, a resume, and your AVS abstract to Angela Klink (angela@avs.org) by May 4, 2015. The abstract must be submitted to an NSTD sponsored or cosponsored session, and at least one of the co-authors on the abstract must be an AVS member at the time of submission; the AVS member co-author(s) and the symposium session should be mentioned in the cover letter. All finalists will be selected by the NSTD Awards Committee, and they will be informed by Sept. 1, 2015. All finalists must present a five minute talk (with additional time for questions) at the NSTD Awards Session, which is planned for noon on Wednesday of the symposium. The winners will be selected based on the quality of the talk, the responses to subsequent questions, and the level of the research. All finalists will receive a cash award of $250. The graduate award winner will receive a certificate and an additional $500. This award is made possible by financial support from NSTD’s 2014 sponsors, who are Asylum Research, Bruker, RHK Technology, and SPECS. John Coburn and Harold Winters Student Award in Plasma Science and Technology - Required Application Materials: 1) A curriculum vitae of the nominee, 2) A one-page letter of endorsement from the student's research advisor/mentor, 3) A copy of the nominee's submitted abstract for the AVS International Symposium. A maximum of six finalists will be selected on the basis of technical and scientific merit and originality of research. Each finalist will receive a cash award of $500 and must present their paper in a PSTD oral session at the AVS Symposium. The Coburn and Winters Award winner will be selected from the finalists on the basis of the oral presentation, the quality of research, the clarity of the presentation, and the potential for the research to advance the field of plasma science. The award consists of an additional cash prize. The selection of finalists and the award winner is made by the PSTD Executive Committee. These awards are contingent upon acceptance of the abstract for presentation in a PSTD session at the AVS International Symposium. Submissions are limited to one application from a particular research group unless previously discussed with the Awards Coordinator. All application materials should be sent to Angela Klink (angela@avs.org) and must be received on or before May 4, 2015. The Thin Film Division's premier, competitive graduate student award is in honor of James M.E. Harper, who was a pioneer in the thin film areas of interconnects and silicides, and was active in the AVS as a Trustee, Director, vice-program chair, Thin Film chair, and many other roles. The Harper Award will be given for the best oral presentation by a graduate student in a Thin Film Division session at the Annual Symposium. The award will consist of a plaque and check for $800. Two runner-up awards of $500 will also be given. Interested applicants should send 1) their CV; 2) a copy of their submitted AVS abstract; and 3) a letter of recommendation from their research advisor. To be eligible for the Harper Award, the student must be the presenter of an oral presentation in the Thin Film Division sessions at the AVS meeting and must be a currently registered graduate student on the date of the abstract submission deadline Application materials should be sent by email to Angela Klink (angela@avs.org). Deadline: May 4, 2015. Vacuum Technology Division Student Poster Competition - Student-Built Vacuum System (alias - Junkyard Wars of Vacuum Technology)" will sponsor a competition for student posters that describe design, development, and/or use of “studentbuilt vacuum systems.” Although these types of vacuum systems may not represent state-of-the-art technology, they often reflect ingenious designs that are guided by unique functionality, and/or are constrained by limited resources. Competitive submissions are expected to reveal inspired and/or cost-effective solutions to real-world issues encountered in typical vacuum system designs. The competition is open to any student who has built a vacuum system for any research purpose. The resulting research project, whether complete or not, should be presented along with the vacuum challenges that have been undertaken. The posters will be judged during the poster session, and cash prizes of up to $500 will be awarded to the winners of the competition. The application deadline for entering the competition is the same as the abstract deadline. Students desiring to enter the competition should send the poster abstract and application form directly to Angela Klink (angela@avs.org) and submit the abstract to the VTD poster abstracts call. Inquiry may be directed to the VTD Student Award Coordinator, Dr. Jay Hendricks (jay.hendricks@nist.gov). Vacuum Technology Division Student Presenter Award is given at the annual AVS International Symposium to encourage students to present their research work in the VTD sessions during the Symposium. To qualify for the award, the applicants must be a full-time student (graduate or undergraduate) at an accredited educational or/and research institute. Candidate students shall submit an abstract for an oral presentation which meets the AVS Symposium requirements and deadlines, and must be able to give an oral presentation (16-minute talk + 4-minute Q&A) at the AVS Symposium. A panel will judge the student presenters, and the awardee will be selected based on the quality of the presented works (with emphasis on his/her contribution to the presented works) and on the presentation itself. The VTD Student Presenter award consists of a certificate and a cash prize. Please send the application form to Angela Klink (angela@avs.org) by May 4, 2015. Inquiry may be directed to the VTD Student Coordinator, Dr. Jay Hendricks (jay.hendricks@nist.gov). Focus Topic Awards The Novel Trends in Synchrotron and FEL-Based Analysis Focus Topic announces a “Best Paper Award” competition at the 62nd AVS Symposium and Exhibition. The award includes a cash prize ($500) and a certificate to the well deserving student presenting his/her paper in an oral or poster session of the SA Focus Topic. Both graduate students and young researchers who defended their dissertation since the last AVS Symposium and Exhibition are eligible. The candidates will be judged on the quality, originality of their research and their skill in presentation (oral/poster). In order to qualify for the competition, interested candidates should submit a cover letter describing their intent to compete in the above mentioned awards along with a copy of their AVS abstract, current CV and application to Angela Klink (angela@avs.org). All application material must be received on or before May 4, 2015. The Focus Topic on Spectroscopic Ellipsometry announces competitive student awards, which will be given for the three best oral student presentations in the EL Focus Topic sessions at the Annual Symposium. Interested applicants should email their CV and a copy of their submitted AVS abstract to Angela Klink (angela@avs.org). The Focus Topic Committee gratefully acknowledges J.A. Woollam Co., Inc. for sponsoring the awards. The deadline for the submission of the application material is August 21, 2015. Society/Division/Group Professional Awards (Not for Students) The AVS Applied Surface Science Division (ASSD) Peter M. A. Sherwood Mid-Career Professional Award recognizes achievements leading to exceptional progress in research and development made by professionals in their mid-career in an area of interest to the ASSD. The award consists of a cash award plus a plaque. The nomination deadline is May 4, 2015. The nomination package must contain the nomination form, nominating letter, biographical materials and three supporting letters. The Awardee will give a featured talk at the AVS International Symposium where the award will be presented. Travel support is available to attend the Symposium. The Award will be made only if an appropriate candidate is identified. All documents including the Nomination Form and the supporting letters should be sent to the ASSD Awards committee at ASSDAwards@avs.org The AVS Biomaterial Interfaces Division (BID) is calling for applications for the Early Career Researchers (ECR) Award. Open to all people submitting abstracts to any BI supported session at the Annual Symposium, the prize consists of symposium registration and $500 towards travel costs as well as an honorary presentation in the relevant BI session. The nominee’s Ph.D. or equivalent degree must have been earned less than 10 years prior to January 1 of the award year. Required application materials: 1) a nominating letter and two supporting letters, 2) a biography and CV of the nominee, and 3) a copy of the abstract. Application materials will be reviewed and the award winner chosen by the BID Executive Committee. Application materials should be sent by email to: Prof Graham J. Leggett, Graham.Leggett@sheffield.ac.uk. Deadline: May 4, 2015. Electronic Materials & Processing Division welcomes applications for the EMPD Postdoctoral cash award for postdoctoral fellows who will be presenting EMPD papers at this year's International Symposium. Be prepared to send (i) a copy of the accepted abstract with Program Number, (ii) a recommendation letter from his/her advisor, and (iii) his/her vitae, plus (iv) a cover letter of request. Deadline: September 4, 2015. Interested postdocs should send application materials by email to: Dr. Leonard J. Brillson, Brillson.1@osu.edu. Magnetic Interfaces and Nanostructures Division: The MIND Postdoctoral Award recognizes outstanding contributions to the areas of interest of MIND. The award comes with a certificate and a cash prize for the winner. Postdoctoral fellows who will be presenting MIND papers at this year's International Symposium are welcome to apply. The application consists of (i) a copy of the accepted abstract, (ii) a recommendation letter from his/her advisor, and (iii) his/her CV, plus (iv) a cover letter of request should be sent by the deadline: October 1 of the Symposium year to Markus Donath (markus.donath@uni-muenster.de) The Nanometer-Scale Science and Technology Division Postdoctoral Award brings recognition to outstanding research by postdocs giving oral presentations in NSTD sessions at AVS international symposia. Postdocs who are within five years of their PhD at the time of the 2015 National Symposium are eligible to apply, and should send a cover letter, resume, and their AVS abstract to the NSTD Awards Coordinator: Stephane Evoy sevoy@ualberta.ca, in a single PDF file. The abstract must be submitted to an NSTD sponsored or co-sponsored session, and at least one of the co-authors on the abstract must be an AVS member at the time of submission; the AVS member co-author(s) and the symposium session should be mentioned in the cover letter. The deadline is July 31. All postdoctoral award finalists will be selected by the NSTD Awards Committee, and they will be informed by Sept. 1, 2015. All finalists must present a five minute talk (with additional time for questions) at the NSTD Awards Session, which is planned for noon on Wednesday of the symposium. The winners will be selected based on the quality of the talk, the responses to subsequent questions, and the level of the research. All finalists will receive a cash award of $250. The postdoc NSTD award winner will receive a certificate and an additional $500. This award is made possible by financial support from NSTD’s 2014 sponsors, who are Asylum Research, Bruker, RHK Technology, and SPECS. The Nanotechnology Recognition Award recognizes members of NSTD for outstanding scientific and technical contributions in the science of nanometer-scale structures, technology transfer involving nanometer-scale structures, and/or the promotion and dissemination of knowledge and development in these areas. It is a cash award plus a certificate. The nomination is for 2016, the deadline is July 31, 2015. The nomination consists of a nominating letter, biographical material, and supporting letters. Specific guidelines as well as the completed nomination should be emailed to: Stephane Evoy (sevoy@ualberta.ca). The Award will be presented at the AVS International Symposium and conference registration will be waived for the award winner. This award is made possible by financial support from NSTD’s 2014 sponsors, who are Asylum Research, Bruker, RHK Technology, and SPECS. The Plasma Science & Technology Division is pleased to solicit nominations for the Plasma Prize, which is awarded annually for outstanding contributions to the field of plasma science and technology. Please submit ONLY the following required application materials: (1) A one-page description citing the reason for the nomination and (2) a biography and Curriculum Vitae of the nominee. Nominations must be submitted as a pdf file by email to: Satoshi Hamaguchi (hamaguch@ppl.eng.osakau.ac.jp). Nomination deadline: May 4, 2015. The Thin Film Division is pleased to solicit nominations for a prestigious award, the Paul H. Holloway Young Investigator Award. This award is named after Professor Paul H. Holloway, who has a distinguished history of scholarship and services to AVS and is still very involved in the AVS. The nominee must be a young scientist or engineer who has contributed outstanding theoretical and experimental work in an area important to the Thin Film Division of AVS. The nominee’s Ph.D. or equivalent degree must have been earned less than 7 years prior to January 1 of the award year. Required application materials: 1) a description citing the reason for nomination, 2) a nominating letter and two supporting letters, and 3) a biography and CV of the nominee. It is expected that an applicant will also submit an Abstract to the Annual Symposium. Application materials will be reviewed and the award winner chosen by the TFD Executive Committee. The award consists of a cash prize, a certificate citing the accomplishments of the recipient, and an honorary lecture at one of the TFD oral sessions at the International Symposium. Application materials should be sent by email to: Jay Lewis; jlewis@rti.org Deadline: May 4, 2015. The VTD Early Career Award strives to recognize outstanding experimental and/or theoretical work related to vacuum science and technology by a scientist or engineer early in their career. The contributions can be directly in the field of vacuum science such as vacuum metrology and measurement, gas dynamics, or designing vacuum equipment, or to related fields such as gas analysis or surface science for accelerator applications. The nominee does not have to be a current member of the AVS. To be eligible, the nominee must meet at least ONE of the following three criteria: The nominee is not older than thirty-six (36) years of age during of the year in which the award is made; the nominee is within 10 years of their undergraduate degree or 5 years of their graduate degree during the year which the award is made; or the nominee holds an early career membership in the AVS. Final eligibility will be subject to the judgment of the VTD Early-Career sub-committee. The award consists of an $800 cash award and a certificate setting forth the reasons for the award. The awardee is expected to give an invited talk in one of the VTD sessions at the AVS National Symposium during the year in which the award is given. To be considered for this award please submit: 1) A nomination letter, not more than 2 pages long, that cites at least one major contribution or significant accomplishment, which should be summarized in three sentences or less and supported by publications, presentations, patents, or other evidence included in the nomination package; 2) A curriculum vitae including a short (one paragraph) biography; 3) at least (1) one letter of recommendation. A phone or web interview with candidates may also be requested. Self-nominations are acceptable. Application materials or questions should be sent by email to James Fedchak (james.fedchak@nist.gov). Deadline: May 5, 2015. AVS is pleased to solicit nominations for the Theodore E. Madey Award for Surface Science and Scientific Exchange. This biennial Award is named after Professor Theodore E. Madey, who had a distinguished history of scholarship and service to AVS, and who enjoyed a rich and fruitful relationship with the surface science community in Poland. To be considered for this Award, the nominee must have demonstrated outstanding theoretical and/or experimental research of interest to the AVS, with special emphasis on surface processes at a fundamental atomic and molecular level, as well as outstanding leadership at the international level. The nominee must also be willing and able to give special honorary talks in Poland, within a specified timeframe. Required nomination materials include: 1) a letter from the nominator that describes the ways in which the applicant fits the criteria for this award; 2) two supporting recommendation letters; 3) a resume of the applicant that includes publications; and 4) a statement signed by the nominee, indicating that s/he is willing to fulfill the obligations of the Award, within the timeframe outlined below. Nomination materials will be reviewed and the award winner will be selected by a special committee appointed by the AVS President. Nomination materials should be sent by email to: Angela Klink, AVS Member Services Administrator, angela@avs.org by Wednesday February 4, 2015. ABSTRACT SUBMISSION IS VIA THE WEB ONLY Deadline: 11:00 p.m. ET, MONDAY, May 4, 2015 (www.avsSymposium.org) Supplemental data (1-2 pages, 1MB) will also be accepted via the web submission process. Instructions may be found at the web site above. RECORDING EQUIPMENT POLICY Use of video recording equipment, cameras, or audio equipment at the AVS International Symposium (oral or poster sessions), Exhibition, Short Courses, and Tutorials is prohibited without prior written approval of AVS. Anyone in violation of these policies will be removed from the premises immediately and their recording will be confiscated. AVS reserves the right to reproduce, by any means selected, any or all of these presentations and materials. ***Please Note: A presenter may present one (1) paper only (either ORAL or POSTER) at the Symposium.*** Session rooms will be set up with screens, microphones, LCD projectors, and laptops (PCs). POSTER sessions will consist of display boards 4 feet high and 8 feet long. There will be limited provision for electricity and no A/V capability at the poster session.
