Understanding and avoiding the formation of voids for rear
Transcription
Understanding and avoiding the formation of voids for rear
Understanding and avoiding the formation of voids for rear passivated silicon solar cells Elias URREJOLAnow with 2, Kristian PETER 1, Heiko PLAGWITZ 2, Gunnar SCHUBERT 2 1 International Solar Energy Research Center - ISC - Konstanz, Germany 2 SUNWAYS AG Photovoltaic Technology, Konstanz, Germany 3rd Workshop on Metallization for Crystalline Silicon Solar Cells Wednesday, 26 October 2011 Part I. Motivation Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 2 Solar Cell Structures: Total vs. Local Total: Al-BSF Solar Cell Local: i-PERC [1] p-Si L-BSF BSF Al rear side L-BSF BSF [1] G. Agostinelli et al. 20th EUPVSEC, Barcelona pp.647-650 (2005). Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 3 Motivation: Void instead of Eutectic El-Analysis FF ~ 78.6% ? L-BSF void formation Rear side completely passivated uncertain origin?[1-[1-4] [1] F. Huster, 20th EUPVSEC, Barcelona, p. 1466-1469 (2005) F.S. Grasso et al, 2nd Workshop on Metallization, Konstanz, pp. 15-21 (2010) [3] T. Lauermann et al, 35th IEEE PVSC, pp. 28-33 (2010) [4] S. Gatz et al., Energy Procedia, vol. 8, 318 (2011) [2] Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 4 Part II. Understanding Void Formation Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 5 Contact Formation: Total vs. Local Standard Process [1] Local Al-Si Contact [2, 5, 6] Al-Si phase diagram (equilibrium) [3] Al Si Cooling liquid down Peak temperature heating Solid 850°C Si diffusion in Al Tpeak [4] (a) (b) (a,b) (c) (c) (a) AlAl-rich solidus in lamellar structure (b) Eutectic (Al - 12.6 % Si) (c) BSF: SiSi-rich solidus [1] DSi DAl F. Huster, 20th EUPVSEC, Barcelona, p. 1466-1469 (2005). F.S. Grasso et al. 2nd Workshop on Metallization, Konstanz, pp. 15-21 (2010). [3] J.L. Murray and A.J. McAlister, Bulletin of Alloy Phase Diagrams 5, 74-84 (1984). [4] E. Urrejola et al. Applied Physics Letters 98, 153508 (2011). [5] V.A. Popovich et al. 24th EUPVSEC, Hamburg, pp. 555-558 (2009) [6] M. Rauer et al. Energy Procedia vol 8, 200 (2011). [2] Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 6 Silicon Diffusion in Aluminum [1] [1] E. Urrejola, et al. Applied Physics Letters, Letters, vol. 98, 153508 (2011) d2: Si diffusion in Al d2 Al d1 d1 3 [µm/°C] p-Si d1: local contact opening Spread of Si in the Al matrix d2 increases by 3 [µm/°C] within Tpeak : {750 - 950}°C does not depend on the contact area Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 7 Impact of Al Amount on Mass Transport [1] [1] E. Urrejola, et al. Journal of Applied Physics vol. 107, 124516 (2010) •Al responsible for mass transport • Si diffuses faster than Al in Al-Si alloys (DSi > DAl)[2] saturation [2] J.O. McCaldin and H. Sankur, Applied Physics Letters, vol. 19, 524 (1971). Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 8 Impact of ∆ Pitch on Void Formation d2 Al d1 p-Si Lp Lp: contact spacing ∆Lp Lp = 2 mm Lp < 0.25 mm influence on void formation? Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 9 Impact of ∆ Pitch on Void Formations Same Al paste, same firing Difference? Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 10 Profile of Si Distribution in Al (EDX Line) Small contact spacing Si Si almost homogeneously distributed in the Al matrix Si Si Si Large contact spacing ~ no Si in middle part! Si Void: Si directly obove the opening < Si overlying the dielectric barrier Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 11 Comparable with Literature C. J. Kircher, Kircher, Journal of Applied Physics, vol. 47, 5394 (1976). DURING COOLING: The reduced Si concentration in the Al adjacent to contact area is due to Si diffusing back and regrowing on the Si surface J. O. McCaldin, McCaldin, Applied Physics Letters, vol. 20, 171 (1972). DURING COOLING: 1. dissolved Si is unable to go the distance to the substrate and remains as precipitates 2. Si at the AlAl-Si interface can easily diffuse to the substrate Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 12 Concentration of Si in Al (EDX/EDS) L-BSF Al - 84% Si - 16% Large V Al - 69% Si - 12% O - 19% Small V Al - 62% Si - 18% O - 20% Large V Al - 72% Si - 10% O - 18% Small V Al - 65% Si - 12% O - 23% Volume contained in void distributed in the Al matrix Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 13 Hypothesis of Void Formation Non equilibrium process! void complete formed At the Tpeak: Al/Si melt transferred into Al matrix void is formed During cooling: Si tries to diffuse back and solidifies in Al (high concentration of Si at the interface) no BSF was found (?) DSi > DAl void with BSF During cooling down: Si recrystallizes epitaxially + Al Si (BSF) If cooling is faster than recrystallization and DSi Si does not reach the interface and void is formed. Rest of Si solidifies in Al. Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 14 Understanding the Formation of Voids void no BSF eutectic below Al void + BSF + eutectic formations L-BSF eutectic below Al Al - 87% Si - 13% voids appear at Tpeak and / or during cooling down Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 15 Part III. How to avoid the voids? Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 16 1. Effect of gravity on the Al-Si morphology [1] [1] E. Urrejola, et al. Journal of Applied Physics, vol. 110, 056104 056104 (2011) Due to Al2O3 the Al paste does not move during the alloying process [2], thus this phenomenon must be due to gravity [1] Case B Case A [2] 1 L. Sardi et al. Solar Cells, vol 11, 51 (1984). Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 17 2. Optimization of Contact Spacing [1] [1] E. Urrejola, et al. Energy Procedia, Procedia, vol. 8, 331 (2011) Lp [µm] Eutectic or void depth [µ [µm] BSF [µm] Voids/eutectic [%] 100 14± 14±2 5.7 – 7 8 250 23± 23±2 4.5 – 4.7 25 700 23± 23±2 4.1 – 4.5 87 1000 27± 27±2 - 100 Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 18 3. Others from Literature Reducing DSi SiAl (e.g. Si in the Al paste [1, 2] well formed L-BSF reduced recombination [3]) Paste development to optimize Si – Al mass transfer [4] Firing optimization [5] [1] 1 M. Rauer et al. IEEE Electron Device Letters vol. 32, 916 (2011) A. Urueña et al. 24th EUPVSEC, pp. 1483-1486 (2009). [3] J. Müller et al. IEEE Transactions on Electron Devices vol. 58, 3239 (2011). [4] V. Meemongkolkiat, 4th WCPEC, Hawaii pp. 1138-1141 (2006). [5] T. Lauermann et al. 26th EUPVSEC, Hamburg pp. 1137-1143 (2011) [2] Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 19 Summary • Si diffusion into Al must be controlled • Voids formation depends on: – – – – Diffusion of Si into Al and temperature: DSi > DAl Concentration and distribution of Si in the Al layer Amount of Al and contact spacing Others: paste, firing parameters, surface ablation • Avoiding voids ☺: – – – – Al on top during firing Reducing DSi SiAl (e.g. Si in Al before firing) Contact spacing optimization Paste development to optimize Si – Al mass transfer Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 20 Acknowledgements The authors gratefully acknowledge the financial support by the German Federal Ministry of Education and Research within the framework of the Leading-Edge Cluster Competition and the research cluster Solarvalley Central Germany under contract No. 03SSF0335I, and Merck KGaA for the kind supply of the etching paste. Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 21 THANK YOU FOR YOUR ATTENTION elias.urrejola@sunways.de Understanding and avoiding the formation of voids for rear passivated silicon solar cells - Elias Urrejola 22